Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition

M. Yoshihara, A. Sekiya, T. Morita, K. Ishii, S. Shimoto, S. Sakai, Yoshimichi Ohki

    Research output: Contribution to journalArticle

    18 Citations (Scopus)

    Abstract

    Rare-earth-doped thin SiO2 films were made by plasma-enhanced chemical vapour deposition using a complex containing chelating ligands and tetraethoxysilane. By this means of deposition, the film was successfully doped with terbium or erbium and the luminescence properties were investigated. In the case of Tb3+-doped films, strong luminescence peaks from the 5D4 level were observed during excitation by a KrF excimer laser. Upon thermal treatment at 800 or 900°C, luminescence peaks from the 5D3 level appear. Under DC voltages, electroluminescence from the 5D4 level was also observed.

    Original languageEnglish
    Pages (from-to)1908-1912
    Number of pages5
    JournalJournal of Physics D: Applied Physics
    Volume30
    Issue number13
    DOIs
    Publication statusPublished - 1997 Jul 7

    Fingerprint

    Plasma enhanced chemical vapor deposition
    Rare earths
    Luminescence
    rare earth elements
    vapor deposition
    luminescence
    Terbium
    Erbium
    terbium
    Electroluminescence
    Excimer lasers
    Chelation
    electroluminescence
    excimer lasers
    erbium
    direct current
    Ligands
    Heat treatment
    Thin films
    ligands

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition. / Yoshihara, M.; Sekiya, A.; Morita, T.; Ishii, K.; Shimoto, S.; Sakai, S.; Ohki, Yoshimichi.

    In: Journal of Physics D: Applied Physics, Vol. 30, No. 13, 07.07.1997, p. 1908-1912.

    Research output: Contribution to journalArticle

    Yoshihara, M. ; Sekiya, A. ; Morita, T. ; Ishii, K. ; Shimoto, S. ; Sakai, S. ; Ohki, Yoshimichi. / Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition. In: Journal of Physics D: Applied Physics. 1997 ; Vol. 30, No. 13. pp. 1908-1912.
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