Reaction of Si with HCl to form chlorosilanes time dependent nature and reaction model

Suguru Noda, Katsuaki Tanabe, Takashi Yahiro, Toshio Ohsawa, Hiroshi Komiyama

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We propose a chemical vapor deposition (CVD) process with closed gas recycling for making low-cost, crystalline silicon thin films for solar cells, which connects chlorosilane synthesis from Si and HCl with Si thin-film growth by CVD from chlorosilanes. In this work we studied the formation of chlorosilanes by the reaction of Si with HCl at temperatures ranging from 623 to 723 K. The reaction rate is time dependent, and many pores are formed on the surface of particles after reaction. These pores are active sites for chemical reactions, and the reaction rates increase with increasing pore area. The rate can be correlated with the conversion ratio of Si, and the temporal evolution of the reaction rate can be explained by a reaction model called the shrinking-core model with growing pores. By using this model, we estimated the reaction rates per unit area of activated surfaces and converted them into a rate equation that can be used for the reactor design. The incubation time of the reaction can be shortened by pretreating the Si particles in a fluidized bed, which probably creates defects in the native oxide layers on the particles, which in turn become reactive sites.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume151
Issue number6
DOIs
Publication statusPublished - 2004
Externally publishedYes

Fingerprint

chlorosilanes
Reaction rates
reaction kinetics
porosity
Chemical vapor deposition
vapor deposition
reactor design
Thin films
Silicon
Film growth
thin films
recycling
Fluidized beds
Oxides
Recycling
beds
Chemical reactions
chemical reactions
Solar cells
solar cells

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Reaction of Si with HCl to form chlorosilanes time dependent nature and reaction model. / Noda, Suguru; Tanabe, Katsuaki; Yahiro, Takashi; Ohsawa, Toshio; Komiyama, Hiroshi.

In: Journal of the Electrochemical Society, Vol. 151, No. 6, 2004.

Research output: Contribution to journalArticle

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