Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces

M. Hasegawa*, Naoto Kobayashi, N. Hayashi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


Reactions between monolayer Fe deposited on Si(001)-2 × 1 and -dihydride surfaces are studied in situ by reflection high-energy electron diffraction and Rutherford backscattering spectrometry with the use of 25 keV hydrogen ions. After room temperature deposition Fe reacts with Si(001)-2 × 1 substrate resulting in the formation of polycrystalline Fe5Si3. By annealing to 560-650°C composite heteroepitaxial layers of both type A and type B β-FeSi2 are formed. On Si(001)-dihydride surface polycrystalline Fe is observed after room temperature deposition, and reaction between Fe and Si(001)-dihydride surface is not likely at RT. After annealing above 700°C 3D rough surface is formed in the case of the dihydride surface. The details of the reaction between monolayer Fe and the dihydride surface are largely different from the reaction between Fe and the 2 × 1 clean surface.

Original languageEnglish
Pages (from-to)931-936
Number of pages6
JournalSurface Science
Publication statusPublished - 1996 Jun 20
Externally publishedYes


  • Iron
  • Low index single crystal surfaces
  • Medium energy ion scattering (MEIS)
  • Reflection high-energy electron diffraction (RHEED)
  • Silicides
  • Silicon
  • Surface structure, morphology, roughness and topography

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces


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