Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces

M. Hasegawa; Naoto Kobayashi; N. Hayashi

doi:10.1016/0039-6028(96)00294-4

Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces

M. Hasegawa^*, Naoto Kobayashi, N. Hayashi

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Reactions between monolayer Fe deposited on Si(001)-2 × 1 and -dihydride surfaces are studied in situ by reflection high-energy electron diffraction and Rutherford backscattering spectrometry with the use of 25 keV hydrogen ions. After room temperature deposition Fe reacts with Si(001)-2 × 1 substrate resulting in the formation of polycrystalline Fe₅Si₃. By annealing to 560-650°C composite heteroepitaxial layers of both type A and type B β-FeSi₂ are formed. On Si(001)-dihydride surface polycrystalline Fe is observed after room temperature deposition, and reaction between Fe and Si(001)-dihydride surface is not likely at RT. After annealing above 700°C 3D rough surface is formed in the case of the dihydride surface. The details of the reaction between monolayer Fe and the dihydride surface are largely different from the reaction between Fe and the 2 × 1 clean surface.

Original language	English
Pages (from-to)	931-936
Number of pages	6
Journal	Surface Science
Volume	357-358
DOIs	https://doi.org/10.1016/0039-6028(96)00294-4
Publication status	Published - 1996 Jun 20
Externally published	Yes

Keywords

Iron
Low index single crystal surfaces
Medium energy ion scattering (MEIS)
Reflection high-energy electron diffraction (RHEED)
Silicides
Silicon
Surface structure, morphology, roughness and topography

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Condensed Matter Physics
Surfaces and Interfaces

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10.1016/0039-6028(96)00294-4

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title = "Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces",

abstract = "Reactions between monolayer Fe deposited on Si(001)-2 × 1 and -dihydride surfaces are studied in situ by reflection high-energy electron diffraction and Rutherford backscattering spectrometry with the use of 25 keV hydrogen ions. After room temperature deposition Fe reacts with Si(001)-2 × 1 substrate resulting in the formation of polycrystalline Fe5Si3. By annealing to 560-650°C composite heteroepitaxial layers of both type A and type B β-FeSi2 are formed. On Si(001)-dihydride surface polycrystalline Fe is observed after room temperature deposition, and reaction between Fe and Si(001)-dihydride surface is not likely at RT. After annealing above 700°C 3D rough surface is formed in the case of the dihydride surface. The details of the reaction between monolayer Fe and the dihydride surface are largely different from the reaction between Fe and the 2 × 1 clean surface.",

keywords = "Iron, Low index single crystal surfaces, Medium energy ion scattering (MEIS), Reflection high-energy electron diffraction (RHEED), Silicides, Silicon, Surface structure, morphology, roughness and topography",

author = "M. Hasegawa and Naoto Kobayashi and N. Hayashi",

year = "1996",

month = jun,

day = "20",

doi = "10.1016/0039-6028(96)00294-4",

language = "English",

volume = "357-358",

pages = "931--936",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier",

}

TY - JOUR

T1 - Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces

AU - Hasegawa, M.

AU - Kobayashi, Naoto

AU - Hayashi, N.

PY - 1996/6/20

Y1 - 1996/6/20

N2 - Reactions between monolayer Fe deposited on Si(001)-2 × 1 and -dihydride surfaces are studied in situ by reflection high-energy electron diffraction and Rutherford backscattering spectrometry with the use of 25 keV hydrogen ions. After room temperature deposition Fe reacts with Si(001)-2 × 1 substrate resulting in the formation of polycrystalline Fe5Si3. By annealing to 560-650°C composite heteroepitaxial layers of both type A and type B β-FeSi2 are formed. On Si(001)-dihydride surface polycrystalline Fe is observed after room temperature deposition, and reaction between Fe and Si(001)-dihydride surface is not likely at RT. After annealing above 700°C 3D rough surface is formed in the case of the dihydride surface. The details of the reaction between monolayer Fe and the dihydride surface are largely different from the reaction between Fe and the 2 × 1 clean surface.

AB - Reactions between monolayer Fe deposited on Si(001)-2 × 1 and -dihydride surfaces are studied in situ by reflection high-energy electron diffraction and Rutherford backscattering spectrometry with the use of 25 keV hydrogen ions. After room temperature deposition Fe reacts with Si(001)-2 × 1 substrate resulting in the formation of polycrystalline Fe5Si3. By annealing to 560-650°C composite heteroepitaxial layers of both type A and type B β-FeSi2 are formed. On Si(001)-dihydride surface polycrystalline Fe is observed after room temperature deposition, and reaction between Fe and Si(001)-dihydride surface is not likely at RT. After annealing above 700°C 3D rough surface is formed in the case of the dihydride surface. The details of the reaction between monolayer Fe and the dihydride surface are largely different from the reaction between Fe and the 2 × 1 clean surface.

KW - Iron

KW - Low index single crystal surfaces

KW - Medium energy ion scattering (MEIS)

KW - Reflection high-energy electron diffraction (RHEED)

KW - Silicides

KW - Silicon

KW - Surface structure, morphology, roughness and topography

UR - http://www.scopus.com/inward/record.url?scp=13544272162&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=13544272162&partnerID=8YFLogxK

U2 - 10.1016/0039-6028(96)00294-4

DO - 10.1016/0039-6028(96)00294-4

M3 - Article

AN - SCOPUS:13544272162

SN - 0039-6028

VL - 357-358

SP - 931

EP - 936

JO - Surface Science

JF - Surface Science

ER -

Reactions of monolayer Fe with Si(001)-dihydride and -2 × 1 surfaces

Abstract

Keywords

ASJC Scopus subject areas

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