Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu; Yoshimichi Ohki; Makoto Fujimaki; Koichi Awazu; Junji Tominaga; Kimikazu Sasa; Tetsuro Komatsubara

doi:10.1016/j.nimb.2008.07.027

Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu, Yoshimichi Ohki, Makoto Fujimaki, Koichi Awazu, Junji Tominaga, Kimikazu Sasa, Tetsuro Komatsubara

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.

Original language	English
Pages (from-to)	4762-4765
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	266
Issue number	21
DOIs	https://doi.org/10.1016/j.nimb.2008.07.027
Publication status	Published - 2008 Nov 1

Keywords

Birefringence
Ion implantation
Planar lightwave circuit
Polarization dependent loss

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/j.nimb.2008.07.027

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Yu, S. J., Ohki, Y., Fujimaki, M., Awazu, K., Tominaga, J., Sasa, K., & Komatsubara, T. (2008). Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 266(21), 4762-4765. https://doi.org/10.1016/j.nimb.2008.07.027

Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence. / Yu, Seung Jun; Ohki, Yoshimichi; Fujimaki, Makoto; Awazu, Koichi; Tominaga, Junji; Sasa, Kimikazu; Komatsubara, Tetsuro.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 266, No. 21, 01.11.2008, p. 4762-4765.

Research output: Contribution to journal › Article › peer-review

Yu, SJ, Ohki, Y, Fujimaki, M, Awazu, K, Tominaga, J, Sasa, K & Komatsubara, T 2008, 'Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 266, no. 21, pp. 4762-4765. https://doi.org/10.1016/j.nimb.2008.07.027

Yu, Seung Jun ; Ohki, Yoshimichi ; Fujimaki, Makoto ; Awazu, Koichi ; Tominaga, Junji ; Sasa, Kimikazu ; Komatsubara, Tetsuro. / Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence. In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2008 ; Vol. 266, No. 21. pp. 4762-4765.

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