Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu, Yoshimichi Ohki, Makoto Fujimaki, Koichi Awazu, Junji Tominaga, Kimikazu Sasa, Tetsuro Komatsubara

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.

    Original languageEnglish
    Pages (from-to)4762-4765
    Number of pages4
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume266
    Issue number21
    DOIs
    Publication statusPublished - 2008 Nov

    Fingerprint

    Birefringence
    Ion implantation
    birefringence
    ion implantation
    Polarization
    Networks (circuits)
    polarization
    oxygen ions
    Oxygen
    cross sections
    Ions

    Keywords

    • Birefringence
    • Ion implantation
    • Planar lightwave circuit
    • Polarization dependent loss

    ASJC Scopus subject areas

    • Instrumentation
    • Nuclear and High Energy Physics

    Cite this

    Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence. / Yu, Seung Jun; Ohki, Yoshimichi; Fujimaki, Makoto; Awazu, Koichi; Tominaga, Junji; Sasa, Kimikazu; Komatsubara, Tetsuro.

    In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 266, No. 21, 11.2008, p. 4762-4765.

    Research output: Contribution to journalArticle

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    AU - Komatsubara, Tetsuro

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