Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu, Yoshimichi Ohki, Makoto Fujimaki, Koichi Awazu, Junji Tominaga, Kimikazu Sasa, Tetsuro Komatsubara

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.

Original languageEnglish
Pages (from-to)4762-4765
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume266
Issue number21
DOIs
Publication statusPublished - 2008 Nov 1

Keywords

  • Birefringence
  • Ion implantation
  • Planar lightwave circuit
  • Polarization dependent loss

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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