Reliability of source-to-drain non-uniformly doped channel (NUDC) mOSFETs for sub-quarter-micron region

Masayoshi Shirahata, Yoshinori Okumura, Yuji Abe, Takashi Kuroi, Masahide Inuishi, Hirokazu Miyoshi

Research output: Contribution to journalArticle

Fingerprint Dive into the research topics of 'Reliability of source-to-drain non-uniformly doped channel (NUDC) mOSFETs for sub-quarter-micron region'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science