Research and Development of High Performance Soft Magnetic Thin Films

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

Original languageEnglish
Pages (from-to)894-899
Number of pages6
JournalElectrochemistry
Volume67
Issue number9
Publication statusPublished - 1999 Sep
Externally publishedYes

Fingerprint

Magnetic thin films
Magnetic films
Thin films
Magnetic recording
Magnetic flux
Coercive force
Magnetic properties
Corrosion

Keywords

  • Electrodeposition
  • High ρ Film
  • High B Film
  • Soft Magnetic Film

ASJC Scopus subject areas

  • Electrochemistry

Cite this

Research and Development of High Performance Soft Magnetic Thin Films. / Osaka, Tetsuya; Momma, Toshiyuki; Yokoshima, Tokihiko.

In: Electrochemistry, Vol. 67, No. 9, 09.1999, p. 894-899.

Research output: Contribution to journalArticle

@article{bb771da18f7c43e2946e110e18acba0a,
title = "Research and Development of High Performance Soft Magnetic Thin Films",
abstract = "Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.",
keywords = "Electrodeposition, High ρ Film, High B Film, Soft Magnetic Film",
author = "Tetsuya Osaka and Toshiyuki Momma and Tokihiko Yokoshima",
year = "1999",
month = "9",
language = "English",
volume = "67",
pages = "894--899",
journal = "Electrochemistry",
issn = "1344-3542",
publisher = "Electrochemical Society of Japan",
number = "9",

}

TY - JOUR

T1 - Research and Development of High Performance Soft Magnetic Thin Films

AU - Osaka, Tetsuya

AU - Momma, Toshiyuki

AU - Yokoshima, Tokihiko

PY - 1999/9

Y1 - 1999/9

N2 - Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

AB - Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

KW - Electrodeposition

KW - High ρ Film

KW - High B Film

KW - Soft Magnetic Film

UR - http://www.scopus.com/inward/record.url?scp=0037846505&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037846505&partnerID=8YFLogxK

M3 - Article

VL - 67

SP - 894

EP - 899

JO - Electrochemistry

JF - Electrochemistry

SN - 1344-3542

IS - 9

ER -