Robust high-κ response in molecularly thin perovskite nanosheets

Minoru Osada, Kosho Akatsuka, Yasuo Ebina, Hiroshi Funakubo, Kanta Ono, Kazunori Takada, Takayoshi Sasaki

Research output: Contribution to journalArticle

112 Citations (Scopus)

Abstract

Size-induced suppression of permittivity in perovskite thin films is a fundamental problem that has remained unresolved for decades. This size-effect issue becomes increasingly important due to the integration of perovskite nanofilms into high-κ capacitors, as well as concerns that intrinsic size effects may limit their device performance. Here, we report a new approach to produce robust high-κ nanodielectrics using perovskite nanosheet (Ca 2Nb3O10), a new class of nanomaterials that is derived from layered compounds by exfoliation. By a solution-based bottom-up approach using perovskite nanosheets, we have successfully fabricated multilayer nanofilms directly on SrRuO3 or Pt substrates without any interfacial dead layers. These nanofilms exhibit high dielectric constant (>200), the largest value seen so far in perovskite films with a thickness down to 10 nm. Furthermore, the superior high-κ properties are a size-effect-free characteristic with low leakage current density (<10 -7 A cm-2). Our work provides a key for understanding the size effect and also represents a step toward a bottom-up paradigm for future high-κ devices.

Original languageEnglish
Pages (from-to)5225-5232
Number of pages8
JournalACS Nano
Volume4
Issue number9
DOIs
Publication statusPublished - 2010 Sep 28
Externally publishedYes

Keywords

  • high-κdielectrics
  • layer-by-layer assembly
  • perovskite nanosheets
  • size effect

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Physics and Astronomy(all)

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  • Cite this

    Osada, M., Akatsuka, K., Ebina, Y., Funakubo, H., Ono, K., Takada, K., & Sasaki, T. (2010). Robust high-κ response in molecularly thin perovskite nanosheets. ACS Nano, 4(9), 5225-5232. https://doi.org/10.1021/nn101453v