Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza, Kentaro Ishibashi, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

Original languageEnglish
Pages (from-to)06FH211-06FH213
JournalJapanese journal of applied physics
Volume48
Issue number6 PART 2
DOIs
Publication statusPublished - 2009 Jun 1

    Fingerprint

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this