Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza, Kentaro Ishibashi, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

Original languageEnglish
JournalJapanese Journal of Applied Physics
Volume48
Issue number6 PART 2
DOIs
Publication statusPublished - 2009 Jun

Fingerprint

Nanoimprint lithography
Nanostructures
lithography
Fabrication
fabrication
Optical devices
Lithography
Quartz
quartz
wafers

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography. / Kataza, Shingo; Ishibashi, Kentaro; Kokubo, Mitsunori; Goto, Hiroshi; Mizuno, Jun; Shoji, Shuichi.

In: Japanese Journal of Applied Physics, Vol. 48, No. 6 PART 2, 06.2009.

Research output: Contribution to journalArticle

Kataza, Shingo ; Ishibashi, Kentaro ; Kokubo, Mitsunori ; Goto, Hiroshi ; Mizuno, Jun ; Shoji, Shuichi. / Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography. In: Japanese Journal of Applied Physics. 2009 ; Vol. 48, No. 6 PART 2.
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