Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+

Yukio Fujiwara, Kouji Kondou, Kouji Watanabe, Hidehiko Nonaka, Naoaki Saito, Toshiyuki Fujimoto, Akira Kurokawa, Shingo Ichimura, Mitsuhiro Tomita

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Tetrairidium dodecacarbonyl, Ir4(CO)12, is a massive compound called metal cluster complex, which has a molecular weight of 1104.9. Using an Ir4(CO)7Y+ primary ion beam, secondary ion mass spectrometry (SIMS) of boron-delta-doped silicon samples was performed. Depth resolution, defined by 1 /e decay length for the trailing edge of the boron delta layer, was investigated in the beam energy ranging from 2.5 to 10keV at an incident angle of 45°. Experimental results showed that the depth resolution improved with oxygen partial pressure at a beam energy of 5 keV. It was confirmed that the depth resolution without oxygen flooding monotonically improved as beam energy decreased. Furthermore, it was found that the favorable effect of oxygen flooding on depth resolution weakened as beam energy was reduced.

Original languageEnglish
Pages (from-to)7599-7601
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number11
DOIs
Publication statusPublished - 2007 Nov 6
Externally publishedYes

Fingerprint

Depth profiling
Secondary ion mass spectrometry
molecular ions
Ion beams
secondary ion mass spectrometry
molecular beams
Boron
boron
ion beams
Silicon
Oxygen
silicon
oxygen
Partial pressure
energy
trailing edges
metal clusters
Molecular weight
partial pressure
molecular weight

Keywords

  • Atomic mixing
  • Boron
  • Cluster
  • Decay length
  • Depth profiling
  • Depth resolution
  • Ion beam
  • Ir(CO)
  • Silicon
  • SIMS

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+. / Fujiwara, Yukio; Kondou, Kouji; Watanabe, Kouji; Nonaka, Hidehiko; Saito, Naoaki; Fujimoto, Toshiyuki; Kurokawa, Akira; Ichimura, Shingo; Tomita, Mitsuhiro.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 11, 06.11.2007, p. 7599-7601.

Research output: Contribution to journalArticle

Fujiwara, Yukio ; Kondou, Kouji ; Watanabe, Kouji ; Nonaka, Hidehiko ; Saito, Naoaki ; Fujimoto, Toshiyuki ; Kurokawa, Akira ; Ichimura, Shingo ; Tomita, Mitsuhiro. / Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2007 ; Vol. 46, No. 11. pp. 7599-7601.
@article{c1e0015abeb64a978f2ce381627761e4,
title = "Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+",
abstract = "Tetrairidium dodecacarbonyl, Ir4(CO)12, is a massive compound called metal cluster complex, which has a molecular weight of 1104.9. Using an Ir4(CO)7Y+ primary ion beam, secondary ion mass spectrometry (SIMS) of boron-delta-doped silicon samples was performed. Depth resolution, defined by 1 /e decay length for the trailing edge of the boron delta layer, was investigated in the beam energy ranging from 2.5 to 10keV at an incident angle of 45°. Experimental results showed that the depth resolution improved with oxygen partial pressure at a beam energy of 5 keV. It was confirmed that the depth resolution without oxygen flooding monotonically improved as beam energy decreased. Furthermore, it was found that the favorable effect of oxygen flooding on depth resolution weakened as beam energy was reduced.",
keywords = "Atomic mixing, Boron, Cluster, Decay length, Depth profiling, Depth resolution, Ion beam, Ir(CO), Silicon, SIMS",
author = "Yukio Fujiwara and Kouji Kondou and Kouji Watanabe and Hidehiko Nonaka and Naoaki Saito and Toshiyuki Fujimoto and Akira Kurokawa and Shingo Ichimura and Mitsuhiro Tomita",
year = "2007",
month = "11",
day = "6",
doi = "10.1143/JJAP.46.7599",
language = "English",
volume = "46",
pages = "7599--7601",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11",

}

TY - JOUR

T1 - Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+

AU - Fujiwara, Yukio

AU - Kondou, Kouji

AU - Watanabe, Kouji

AU - Nonaka, Hidehiko

AU - Saito, Naoaki

AU - Fujimoto, Toshiyuki

AU - Kurokawa, Akira

AU - Ichimura, Shingo

AU - Tomita, Mitsuhiro

PY - 2007/11/6

Y1 - 2007/11/6

N2 - Tetrairidium dodecacarbonyl, Ir4(CO)12, is a massive compound called metal cluster complex, which has a molecular weight of 1104.9. Using an Ir4(CO)7Y+ primary ion beam, secondary ion mass spectrometry (SIMS) of boron-delta-doped silicon samples was performed. Depth resolution, defined by 1 /e decay length for the trailing edge of the boron delta layer, was investigated in the beam energy ranging from 2.5 to 10keV at an incident angle of 45°. Experimental results showed that the depth resolution improved with oxygen partial pressure at a beam energy of 5 keV. It was confirmed that the depth resolution without oxygen flooding monotonically improved as beam energy decreased. Furthermore, it was found that the favorable effect of oxygen flooding on depth resolution weakened as beam energy was reduced.

AB - Tetrairidium dodecacarbonyl, Ir4(CO)12, is a massive compound called metal cluster complex, which has a molecular weight of 1104.9. Using an Ir4(CO)7Y+ primary ion beam, secondary ion mass spectrometry (SIMS) of boron-delta-doped silicon samples was performed. Depth resolution, defined by 1 /e decay length for the trailing edge of the boron delta layer, was investigated in the beam energy ranging from 2.5 to 10keV at an incident angle of 45°. Experimental results showed that the depth resolution improved with oxygen partial pressure at a beam energy of 5 keV. It was confirmed that the depth resolution without oxygen flooding monotonically improved as beam energy decreased. Furthermore, it was found that the favorable effect of oxygen flooding on depth resolution weakened as beam energy was reduced.

KW - Atomic mixing

KW - Boron

KW - Cluster

KW - Decay length

KW - Depth profiling

KW - Depth resolution

KW - Ion beam

KW - Ir(CO)

KW - Silicon

KW - SIMS

UR - http://www.scopus.com/inward/record.url?scp=35948985971&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=35948985971&partnerID=8YFLogxK

U2 - 10.1143/JJAP.46.7599

DO - 10.1143/JJAP.46.7599

M3 - Article

VL - 46

SP - 7599

EP - 7601

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11

ER -