Secondary-ion-mass-spectrometry depth profiling of ultra-shallow boron delta layers in silicon with massive molecular ion beam of Ir 4(CO)7+

Yukio Fujiwara*, Kouji Kondou, Kouji Watanabe, Hidehiko Nonaka, Naoaki Saito, Toshiyuki Fujimoto, Akira Kurokawa, Shingo Ichimura, Mitsuhiro Tomita

*Corresponding author for this work

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