Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Masaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well as generation of a low release energy on detachment of a cured resin from a template mold. This is because with low mold pollution, fracture on demolding occurred at the interface between the mold and cured resin surfaces rather than at the outermost part of the cured resin. To achieve low mold pollution, we investigated the radical photopolymerization behaviors of fluorescent UV-curable resins and the mechanical properties (fracture toughness, surface hardness, and release energy) of the cured resin films for six types of di(meth)acrylate-based monomers with similar chemical structures, in which polar hydroxy and aromatic bulky bisphenol moieties and methacryloyl or acryloyl reactive groups were present or absent. As a result, we selected bisphenol A glycerolate dimethacrylate (BPAGDM), which contains hydroxy, bisphenol, and methacryloyl moieties, which give good mechanical properties, monomer bulkiness, and mild reactivity, respectively, as a suitable base monomer for UV nanoimprinting under an easily condensable alternative chlorofluorocarbon (HFC-245fa) atmosphere. The fluorescent UV-curable BPAGDM resin was used for UV nanoimprinting and lithographic reactive ion etching of a silicon surface with 32 nm line-and-space patterns without a hard metal layer.

Original languageEnglish
Pages (from-to)4188-4195
Number of pages8
JournalLangmuir
Volume31
Issue number14
DOIs
Publication statusPublished - 2015 Apr 14
Externally publishedYes

Fingerprint

Nanoimprint lithography
acrylates
pollution
resins
Pollution
lithography
Resins
monomers
Monomers
bisphenols
Chlorofluorocarbons
mechanical properties
chlorofluorocarbons
Mechanical properties
Photopolymerization
Fluorescence microscopy
Reactive ion etching
Silicon
acrylic acid
fracture strength

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Nakagawa, M., Kobayashi, K., Hattori, A. N., Ito, S., Hiroshiba, N., Kubo, S., & Tanaka, H. (2015). Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography. Langmuir, 31(14), 4188-4195. https://doi.org/10.1021/acs.langmuir.5b00325

Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography. / Nakagawa, Masaru; Kobayashi, Kei; Hattori, Azusa N.; Ito, Shunya; Hiroshiba, Nobuya; Kubo, Shoichi; Tanaka, Hidekazu.

In: Langmuir, Vol. 31, No. 14, 14.04.2015, p. 4188-4195.

Research output: Contribution to journalArticle

Nakagawa, M, Kobayashi, K, Hattori, AN, Ito, S, Hiroshiba, N, Kubo, S & Tanaka, H 2015, 'Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography', Langmuir, vol. 31, no. 14, pp. 4188-4195. https://doi.org/10.1021/acs.langmuir.5b00325
Nakagawa, Masaru ; Kobayashi, Kei ; Hattori, Azusa N. ; Ito, Shunya ; Hiroshiba, Nobuya ; Kubo, Shoichi ; Tanaka, Hidekazu. / Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography. In: Langmuir. 2015 ; Vol. 31, No. 14. pp. 4188-4195.
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