Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Masaru Nakagawa*, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka

*Corresponding author for this work

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Physics & Astronomy

Engineering & Materials Science

Chemical Compounds