Selective deposition of polystyrene nanoparticles in a nanoetchpit array on a silicon substrate

Manabu Tanaka, Takumi Hosaka, Takashi Tanii, Iwao Ohdomari, Hiroyuki Nishide

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Nanometer-sized polystyrene particles were selectively deposited by interfacial tension in nanometer-sized etchpit arrays made on a silicon substrate.

Original languageEnglish
Pages (from-to)978-979
Number of pages2
JournalChemical Communications
Volume10
Issue number8
Publication statusPublished - 2004 Apr 21

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Polystyrenes
Silicon
Surface tension
Nanoparticles
Substrates

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Selective deposition of polystyrene nanoparticles in a nanoetchpit array on a silicon substrate. / Tanaka, Manabu; Hosaka, Takumi; Tanii, Takashi; Ohdomari, Iwao; Nishide, Hiroyuki.

In: Chemical Communications, Vol. 10, No. 8, 21.04.2004, p. 978-979.

Research output: Contribution to journalArticle

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