Abstract
A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.
Original language | English |
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Pages (from-to) | 372-374 |
Number of pages | 3 |
Journal | Chemistry Letters |
Volume | 44 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2015 |
ASJC Scopus subject areas
- Chemistry(all)