Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

Shintaro Hara, Hirokatsu Miyata, Masahiko Takahashi, Atsushi Shimojima, Kazuyuki Kuroda*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

Original languageEnglish
Pages (from-to)372-374
Number of pages3
JournalChemistry Letters
Volume44
Issue number3
DOIs
Publication statusPublished - 2015

ASJC Scopus subject areas

  • Chemistry(all)

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