Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

Shintaro Hara; Hirokatsu Miyata; Masahiko Takahashi; Atsushi Shimojima; Kazuyuki Kuroda

doi:10.1246/cl.141093

Si substrate as a SiO₂ source for the preparation of mesoporous SiO₂TiO₂ thin films

Shintaro Hara, Hirokatsu Miyata, Masahiko Takahashi, Atsushi Shimojima, Kazuyuki Kuroda^*

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A Si substrate has been proved to be used as a SiO₂ source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH₃ vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

Original language	English
Pages (from-to)	372-374
Number of pages	3
Journal	Chemistry Letters
Volume	44
Issue number	3
DOIs	https://doi.org/10.1246/cl.141093
Publication status	Published - 2015

ASJC Scopus subject areas

Chemistry(all)

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10.1246/cl.141093

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title = "Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films",

abstract = "A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.",

author = "Shintaro Hara and Hirokatsu Miyata and Masahiko Takahashi and Atsushi Shimojima and Kazuyuki Kuroda",

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doi = "10.1246/cl.141093",

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journal = "Chemistry Letters",

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T1 - Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

AU - Hara, Shintaro

AU - Miyata, Hirokatsu

AU - Takahashi, Masahiko

AU - Shimojima, Atsushi

AU - Kuroda, Kazuyuki

PY - 2015

Y1 - 2015

N2 - A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

AB - A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

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DO - 10.1246/cl.141093

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JF - Chemistry Letters

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Si substrate as a SiO₂ source for the preparation of mesoporous SiO₂TiO₂ thin films

Abstract

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