Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

Shintaro Hara, Hirokatsu Miyata, Masahiko Takahashi, Atsushi Shimojima, Kazuyuki Kuroda

    Research output: Contribution to journal › Article

    1 Citation (Scopus)

    Abstract

    A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

    Original languageEnglish
    Pages (from-to)372-374
    Number of pages3
    JournalChemistry Letters
    Volume44
    Issue number3
    DOIs
    Publication statusPublished - 2015

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    Silicates
    Thin films
    Substrates
    Calcination
    Vapors

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

    Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films. / Hara, Shintaro; Miyata, Hirokatsu; Takahashi, Masahiko; Shimojima, Atsushi; Kuroda, Kazuyuki.

    In: Chemistry Letters, Vol. 44, No. 3, 2015, p. 372-374.

    Research output: Contribution to journal › Article

    Hara, S, Miyata, H, Takahashi, M, Shimojima, A & Kuroda, K 2015, 'Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films', Chemistry Letters, vol. 44, no. 3, pp. 372-374. https://doi.org/10.1246/cl.141093
    Hara S, Miyata H, Takahashi M, Shimojima A, Kuroda K. Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films. Chemistry Letters. 2015;44(3):372-374. https://doi.org/10.1246/cl.141093
    Hara, Shintaro ; Miyata, Hirokatsu ; Takahashi, Masahiko ; Shimojima, Atsushi ; Kuroda, Kazuyuki. / Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films. In: Chemistry Letters. 2015 ; Vol. 44, No. 3. pp. 372-374.
    @article{6da3f8ee9c8846588a943c9ec63cc4e3,
    title = "Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films",
    abstract = "A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.",
    author = "Shintaro Hara and Hirokatsu Miyata and Masahiko Takahashi and Atsushi Shimojima and Kazuyuki Kuroda",
    year = "2015",
    doi = "10.1246/cl.141093",
    language = "English",
    volume = "44",
    pages = "372--374",
    journal = "Chemistry Letters",
    issn = "0366-7022",
    publisher = "Chemical Society of Japan",
    number = "3",

    }

    TY - JOUR

    T1 - Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

    AU - Hara, Shintaro

    AU - Miyata, Hirokatsu

    AU - Takahashi, Masahiko

    AU - Shimojima, Atsushi

    AU - Kuroda, Kazuyuki

    PY - 2015

    Y1 - 2015

    N2 - A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

    AB - A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

    UR - http://www.scopus.com/inward/record.url?scp=84924985397&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84924985397&partnerID=8YFLogxK

    U2 - 10.1246/cl.141093

    DO - 10.1246/cl.141093

    M3 - Article

    AN - SCOPUS:84924985397

    VL - 44

    SP - 372

    EP - 374

    JO - Chemistry Letters

    JF - Chemistry Letters

    SN - 0366-7022

    IS - 3

    ER -

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