Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films

Shintaro Hara, Hirokatsu Miyata, Masahiko Takahashi, Atsushi Shimojima, Kazuyuki Kuroda

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    A Si substrate has been proved to be used as a SiO2 source for the preparation of mesoporous silicatitania thin films with cylindrical mesochannels. Exposing mesostructured titaniasurfactant thin films to aqueous NH3 vapor reinforces the pore walls with uniformly distributed silicate species, which retain the mesostructure after calcination.

    Original languageEnglish
    Pages (from-to)372-374
    Number of pages3
    JournalChemistry Letters
    Volume44
    Issue number3
    DOIs
    Publication statusPublished - 2015

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    Silicates
    Thin films
    Substrates
    Calcination
    Vapors

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

    Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films. / Hara, Shintaro; Miyata, Hirokatsu; Takahashi, Masahiko; Shimojima, Atsushi; Kuroda, Kazuyuki.

    In: Chemistry Letters, Vol. 44, No. 3, 2015, p. 372-374.

    Research output: Contribution to journalArticle

    Hara, Shintaro ; Miyata, Hirokatsu ; Takahashi, Masahiko ; Shimojima, Atsushi ; Kuroda, Kazuyuki. / Si substrate as a SiO2 source for the preparation of mesoporous SiO2TiO2 thin films. In: Chemistry Letters. 2015 ; Vol. 44, No. 3. pp. 372-374.
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