Signature of Magnetization in Xe Ions Implanted ZnO: Correlation with Oxygen Defects as Probed by Photoelectron Spectroscopy

D. K. Mishra, Shreenu Pattanaik, Sibashisa Dash, Manoj Kumar Sharma, Pravin Kumar, Sekhar C. Ray, Ratnamala Chatterjee, D. Kanjilal

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

300 keV Xe ions were implanted in single crystals of ZnO at room temperature with three fluences viz. 4.9×1015, 8.1×1015 and 1.1×1016 ions/cm2. The Xe ion implanted ZnO samples were characterized by UV-Vis spectroscopy, X-ray photo-electron spectroscopy (XPS) and SQUID magnetometer. It has been noticed that the samples implanted with lowest and highest ion fluences show magnetization higher than that in the sample implanted with intermediate ion fluence. This unusual trend in the change of the magnetization is attributed to the lattice distortion and the variation in the lattice oxygen concentration as evidenced from the core level XPS results. The results are explained in terms of oxygen vacancies mediated bound magnetic polarons (BMP) and ion induced effects on their formation.

Original languageEnglish
Pages (from-to)8494-8499
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Volume17
Issue number11
DOIs
Publication statusPublished - 2017
Externally publishedYes

Keywords

  • Implantation
  • Magnetism
  • X-ray Photoelectron Spectroscopy
  • Xe Doping
  • ZnO

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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  • Cite this

    Mishra, D. K., Pattanaik, S., Dash, S., Sharma, M. K., Kumar, P., Ray, S. C., Chatterjee, R., & Kanjilal, D. (2017). Signature of Magnetization in Xe Ions Implanted ZnO: Correlation with Oxygen Defects as Probed by Photoelectron Spectroscopy. Journal of Nanoscience and Nanotechnology, 17(11), 8494-8499. https://doi.org/10.1166/jnn.2017.15179