Silicon electrodeposition in water-soluble KF-KCl molten salt: Optimization of electrolysis conditions at 923 K

Kouji Yasuda, Kazuma Maeda, Toshiyuki Nohira, Rika Hagiwara, Takayuki Homma

    Research output: Contribution to journalArticle

    12 Citations (Scopus)

    Abstract

    To establish a new Si-electrodeposition process, the optimum conditions for obtaining adherent, compact, and smooth Si films using molten KF-KCl-K2SiF6 were investigated at 923 K. Galvanostatic electrolysis was conducted on a Ag substrate in eutectic KF-KCl (45:55 mol%) with various current densities (10-500 mA cm-2) and K2SiF6 concentrations (0.5-5.0 mol%). Cross-sectional scanning electron microscopy (SEM) of the deposits revealed that compact and smooth Si films form at intermediate K2SiF6 concentrations and current densities. The relationship between the deposition conditions and Si morphology is discussed in terms of the electrodeposition mechanism.

    Original languageEnglish
    Pages (from-to)D95-D99
    JournalJournal of the Electrochemical Society
    Volume163
    Issue number3
    DOIs
    Publication statusPublished - 2016

    Fingerprint

    molten salts
    Silicon
    electrolysis
    Electrolysis
    Electrodeposition
    electrodeposition
    Molten materials
    Current density
    Salts
    current density
    optimization
    Water
    silicon
    eutectics
    Eutectics
    water
    Deposits
    deposits
    Scanning electron microscopy
    scanning electron microscopy

    ASJC Scopus subject areas

    • Electrochemistry
    • Electronic, Optical and Magnetic Materials
    • Materials Chemistry
    • Surfaces, Coatings and Films
    • Renewable Energy, Sustainability and the Environment
    • Condensed Matter Physics

    Cite this

    Silicon electrodeposition in water-soluble KF-KCl molten salt : Optimization of electrolysis conditions at 923 K. / Yasuda, Kouji; Maeda, Kazuma; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki.

    In: Journal of the Electrochemical Society, Vol. 163, No. 3, 2016, p. D95-D99.

    Research output: Contribution to journalArticle

    Yasuda, Kouji ; Maeda, Kazuma ; Nohira, Toshiyuki ; Hagiwara, Rika ; Homma, Takayuki. / Silicon electrodeposition in water-soluble KF-KCl molten salt : Optimization of electrolysis conditions at 923 K. In: Journal of the Electrochemical Society. 2016 ; Vol. 163, No. 3. pp. D95-D99.
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