Silver metallization for microwave device using aerosol deposition

Yoon Hyun Kim, Ji Won Lee, Hyung Jun Kim, Young Hoon Yun, Song Min Nam

Research output: Contribution to journalArticle

Abstract

We examined the possibility of using aerosol deposition (AD) as a simple, environmentally friendly and dry metallization process capable of acting as an alternative to the electroless and electroplating methods. Silver thick films were fabricated, their characteristics evaluated, and the factors influencing their growth investigated. As a result, silver thick films were successfully fabricated by AD with high deposition rates (10 μm/min) at room temperature. The resistivity of the as-deposited silver thick films was 8-10 times larger than that of the bulk silver. Post-annealing increased the resistivity of the silver films by approximately 2-3 times compared to that of the bulk silver. Microstructural observations revealed an increase in the connectivity between the silver particles after the heat treatments, which reduced the resistivity of the as-deposited silver films.

Original languageEnglish
Pages (from-to)S201-S204
JournalCeramics International
Volume38
Issue numberSUPPL. 1
DOIs
Publication statusPublished - 2012 Jan
Externally publishedYes

Keywords

  • Aerosol deposition (AD)
  • C. Electrical conductivity
  • Metallization process
  • Silver thick films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Silver metallization for microwave device using aerosol deposition'. Together they form a unique fingerprint.

  • Cite this