Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching

Kentaro Wakui, Yuya Yonezu, Takao Aoki, Masahiro Takeoka, Kouichi Semba

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    Diamond nanowires are fabricated on a bulk, single crystalline diamond near an edge of aluminum coating using inductively coupled plasma reactive ion etching. Two different density areas are simultaneously appeared where the dense area has 9 times higher density than that of the sparse area while keeping the size of nanowires almost uniform in these areas. The nanowire sizes realized in the dense (sparse) area are 858 ± 22nm (876 ± 25nm) in height and 126 ± 6 nm (124 ± 7 nm) in diameter, which is suitable for applications in optical quantum information processing.

    Original languageEnglish
    Article number058005
    JournalJapanese Journal of Applied Physics
    Volume56
    Issue number5
    DOIs
    Publication statusPublished - 2017 May 1

    Fingerprint

    Plasma etching
    Reactive ion etching
    Inductively coupled plasma
    Nanowires
    Diamonds
    nanowires
    diamonds
    etching
    Fabrication
    fabrication
    Aluminum coatings
    ions
    aluminum coatings
    Crystalline materials

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Cite this

    Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching. / Wakui, Kentaro; Yonezu, Yuya; Aoki, Takao; Takeoka, Masahiro; Semba, Kouichi.

    In: Japanese Journal of Applied Physics, Vol. 56, No. 5, 058005, 01.05.2017.

    Research output: Contribution to journalArticle

    Wakui, Kentaro ; Yonezu, Yuya ; Aoki, Takao ; Takeoka, Masahiro ; Semba, Kouichi. / Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching. In: Japanese Journal of Applied Physics. 2017 ; Vol. 56, No. 5.
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