Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm

Masaru Nakagawa, Akifumi Nakaya, Yasuto Hoshikawa, Shunya Ito, Nobuya Hiroshiba, Takashi Kyotani

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Ultraviolet (UV) nanoimprint lithography is a promising nanofabrication technology with cost efficiency and high throughput for sub-20 nm size semiconductor, data storage, and optical devices. To test formability of organic resist mask patterns, we investigated whether the type of polymerizable di(meth)acrylate monomer affected the fabrication of cured resin nanopillars by UV nanoimprinting using molds with pores of around 20 nm. We used carbon-coated, porous, anodic aluminum oxide (AAO) films prepared by electrochemical oxidation and thermal chemical vapor deposition as molds, because the pore diameter distribution in the range of 10-40 nm was suitable for combinatorial testing to investigate whether UV-curable resins comprising each monomer were filled into the mold recesses in UV nanoimprinting. Although the UV-curable resins, except for a bisphenol A-based one, detached from the molds without pull-out defects after radical photopolymerization under UV light, the number of cured resin nanopillars was independent of the viscosity of the monomer(s) in each resin. The number of resin nanopillars increased and their diameter decreased as the number of hydroxy groups in the aliphatic diacrylate monomers increased. It was concluded that the filling of the carbon-coated pores having diameters of around 20 nm with UV-curable resins was promoted by the presence of hydroxy groups in the aliphatic di(meth)acrylate monomers.

Original languageEnglish
Pages (from-to)30628-30634
Number of pages7
JournalACS Applied Materials and Interfaces
Volume8
Issue number44
DOIs
Publication statusPublished - 2016 Nov 9
Externally publishedYes

Fingerprint

Aluminum Oxide
Carbon
Resins
Aluminum
Oxides
Monomers
Molds
Semiconductor storage
Nanoimprint lithography
Photopolymerization
Electrochemical oxidation
Formability
Optical devices
acrylic acid
Nanotechnology
Oxide films
Masks
Chemical vapor deposition
Throughput
Viscosity

Keywords

  • anodic aluminum oxide
  • carbon coating
  • nanoimprint
  • nanopore
  • resin filling

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm. / Nakagawa, Masaru; Nakaya, Akifumi; Hoshikawa, Yasuto; Ito, Shunya; Hiroshiba, Nobuya; Kyotani, Takashi.

In: ACS Applied Materials and Interfaces, Vol. 8, No. 44, 09.11.2016, p. 30628-30634.

Research output: Contribution to journalArticle

Nakagawa, Masaru ; Nakaya, Akifumi ; Hoshikawa, Yasuto ; Ito, Shunya ; Hiroshiba, Nobuya ; Kyotani, Takashi. / Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm. In: ACS Applied Materials and Interfaces. 2016 ; Vol. 8, No. 44. pp. 30628-30634.
@article{af11292fec664234b32fae708efff6c3,
title = "Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm",
abstract = "Ultraviolet (UV) nanoimprint lithography is a promising nanofabrication technology with cost efficiency and high throughput for sub-20 nm size semiconductor, data storage, and optical devices. To test formability of organic resist mask patterns, we investigated whether the type of polymerizable di(meth)acrylate monomer affected the fabrication of cured resin nanopillars by UV nanoimprinting using molds with pores of around 20 nm. We used carbon-coated, porous, anodic aluminum oxide (AAO) films prepared by electrochemical oxidation and thermal chemical vapor deposition as molds, because the pore diameter distribution in the range of 10-40 nm was suitable for combinatorial testing to investigate whether UV-curable resins comprising each monomer were filled into the mold recesses in UV nanoimprinting. Although the UV-curable resins, except for a bisphenol A-based one, detached from the molds without pull-out defects after radical photopolymerization under UV light, the number of cured resin nanopillars was independent of the viscosity of the monomer(s) in each resin. The number of resin nanopillars increased and their diameter decreased as the number of hydroxy groups in the aliphatic diacrylate monomers increased. It was concluded that the filling of the carbon-coated pores having diameters of around 20 nm with UV-curable resins was promoted by the presence of hydroxy groups in the aliphatic di(meth)acrylate monomers.",
keywords = "anodic aluminum oxide, carbon coating, nanoimprint, nanopore, resin filling",
author = "Masaru Nakagawa and Akifumi Nakaya and Yasuto Hoshikawa and Shunya Ito and Nobuya Hiroshiba and Takashi Kyotani",
year = "2016",
month = "11",
day = "9",
doi = "10.1021/acsami.6b10561",
language = "English",
volume = "8",
pages = "30628--30634",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "44",

}

TY - JOUR

T1 - Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm

AU - Nakagawa, Masaru

AU - Nakaya, Akifumi

AU - Hoshikawa, Yasuto

AU - Ito, Shunya

AU - Hiroshiba, Nobuya

AU - Kyotani, Takashi

PY - 2016/11/9

Y1 - 2016/11/9

N2 - Ultraviolet (UV) nanoimprint lithography is a promising nanofabrication technology with cost efficiency and high throughput for sub-20 nm size semiconductor, data storage, and optical devices. To test formability of organic resist mask patterns, we investigated whether the type of polymerizable di(meth)acrylate monomer affected the fabrication of cured resin nanopillars by UV nanoimprinting using molds with pores of around 20 nm. We used carbon-coated, porous, anodic aluminum oxide (AAO) films prepared by electrochemical oxidation and thermal chemical vapor deposition as molds, because the pore diameter distribution in the range of 10-40 nm was suitable for combinatorial testing to investigate whether UV-curable resins comprising each monomer were filled into the mold recesses in UV nanoimprinting. Although the UV-curable resins, except for a bisphenol A-based one, detached from the molds without pull-out defects after radical photopolymerization under UV light, the number of cured resin nanopillars was independent of the viscosity of the monomer(s) in each resin. The number of resin nanopillars increased and their diameter decreased as the number of hydroxy groups in the aliphatic diacrylate monomers increased. It was concluded that the filling of the carbon-coated pores having diameters of around 20 nm with UV-curable resins was promoted by the presence of hydroxy groups in the aliphatic di(meth)acrylate monomers.

AB - Ultraviolet (UV) nanoimprint lithography is a promising nanofabrication technology with cost efficiency and high throughput for sub-20 nm size semiconductor, data storage, and optical devices. To test formability of organic resist mask patterns, we investigated whether the type of polymerizable di(meth)acrylate monomer affected the fabrication of cured resin nanopillars by UV nanoimprinting using molds with pores of around 20 nm. We used carbon-coated, porous, anodic aluminum oxide (AAO) films prepared by electrochemical oxidation and thermal chemical vapor deposition as molds, because the pore diameter distribution in the range of 10-40 nm was suitable for combinatorial testing to investigate whether UV-curable resins comprising each monomer were filled into the mold recesses in UV nanoimprinting. Although the UV-curable resins, except for a bisphenol A-based one, detached from the molds without pull-out defects after radical photopolymerization under UV light, the number of cured resin nanopillars was independent of the viscosity of the monomer(s) in each resin. The number of resin nanopillars increased and their diameter decreased as the number of hydroxy groups in the aliphatic diacrylate monomers increased. It was concluded that the filling of the carbon-coated pores having diameters of around 20 nm with UV-curable resins was promoted by the presence of hydroxy groups in the aliphatic di(meth)acrylate monomers.

KW - anodic aluminum oxide

KW - carbon coating

KW - nanoimprint

KW - nanopore

KW - resin filling

UR - http://www.scopus.com/inward/record.url?scp=84994761179&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84994761179&partnerID=8YFLogxK

U2 - 10.1021/acsami.6b10561

DO - 10.1021/acsami.6b10561

M3 - Article

AN - SCOPUS:84994761179

VL - 8

SP - 30628

EP - 30634

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 44

ER -