Small changes in work function of the TiC(001) surface with chemisorption of O2 and H2O

C. Oshima, T. Tanaka, M. Aono, R. Nishitani, S. Kawai, F. Yajima

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    Abstract

    Changes in work function of the TiC (001) surface have been measured against O2 and H2O exposure by using photoelectron spectroscopy. The sticking rates are about 1/100 of those for elemental Ti-metal substrate. In the case of oxygen exposure, the work function increases monotonically from 3.8 to 4.2 eV, whereas for H2O a maximum value of work function occurs at an exposure of ∼300L, and its value finally reaches 4.5 eV.

    Original languageEnglish
    Pages (from-to)822-823
    Number of pages2
    JournalApplied Physics Letters
    Volume35
    Issue number10
    DOIs
    Publication statusPublished - 1979

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    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Oshima, C., Tanaka, T., Aono, M., Nishitani, R., Kawai, S., & Yajima, F. (1979). Small changes in work function of the TiC(001) surface with chemisorption of O2 and H2O. Applied Physics Letters, 35(10), 822-823. https://doi.org/10.1063/1.90949