Smoothing of surface of silica glass by heat treatment in wet atmosphere

Kenta Osawa, Hiroyuki Inoue, Atsunobu Masuno, Keiichi Katayama, Yingjiu Zhang, Futoshi Utsuno, Yoshiyuki Sugahara, Kazuo Koya, Akira Fujinoki, Hiromasa Tawarayama, Hiroshi Kawazoe

    Research output: Contribution to journalArticle

    2 Citations (Scopus)

    Abstract

    The effect of heat treatment on the surface morphology of fused silica glass substrates was investigated. It was found that the water vapor pressure during heat treatment had a strong influence on the flattening of the silica glass surface. The surface of the frosted glass changed into a transparent and lustrous surface after heat treatment with water vapor at 1200 C for 48 h, whereas surface irregularities remained for heat treatment under a dry atmosphere. It was suggested that the difference in surface flattening was caused by changes in surface viscosity that depended on the concentration of OH groups on the surface. In order to quantitatively understand the effect of the heat treatment atmosphere, power spectral density (PSD) analysis and a novel peak and valley method were applied to the experimental results. From the PSD analysis, it was found that the Mullins' model could not explain the smoothing behavior by heat treatment. The peak and valley method, which could separate the surface morphology into the surface irregularities and the background undulation, revealed that the Mullins' model limitation was mainly for the surface and the background undulation could be understood within the model. These results indicate that there are different mechanisms between for the surface smoothing and for the relaxation of the background undulation.

    Original languageEnglish
    Article number103520
    JournalJournal of Applied Physics
    Volume109
    Issue number10
    DOIs
    Publication statusPublished - 2011 May 15

    Fingerprint

    silica glass
    smoothing
    heat treatment
    atmospheres
    flattening
    irregularities
    valleys
    water vapor
    water pressure
    vapor pressure
    viscosity

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

    Cite this

    Osawa, K., Inoue, H., Masuno, A., Katayama, K., Zhang, Y., Utsuno, F., ... Kawazoe, H. (2011). Smoothing of surface of silica glass by heat treatment in wet atmosphere. Journal of Applied Physics, 109(10), [103520]. https://doi.org/10.1063/1.3587229

    Smoothing of surface of silica glass by heat treatment in wet atmosphere. / Osawa, Kenta; Inoue, Hiroyuki; Masuno, Atsunobu; Katayama, Keiichi; Zhang, Yingjiu; Utsuno, Futoshi; Sugahara, Yoshiyuki; Koya, Kazuo; Fujinoki, Akira; Tawarayama, Hiromasa; Kawazoe, Hiroshi.

    In: Journal of Applied Physics, Vol. 109, No. 10, 103520, 15.05.2011.

    Research output: Contribution to journalArticle

    Osawa, K, Inoue, H, Masuno, A, Katayama, K, Zhang, Y, Utsuno, F, Sugahara, Y, Koya, K, Fujinoki, A, Tawarayama, H & Kawazoe, H 2011, 'Smoothing of surface of silica glass by heat treatment in wet atmosphere', Journal of Applied Physics, vol. 109, no. 10, 103520. https://doi.org/10.1063/1.3587229
    Osawa K, Inoue H, Masuno A, Katayama K, Zhang Y, Utsuno F et al. Smoothing of surface of silica glass by heat treatment in wet atmosphere. Journal of Applied Physics. 2011 May 15;109(10). 103520. https://doi.org/10.1063/1.3587229
    Osawa, Kenta ; Inoue, Hiroyuki ; Masuno, Atsunobu ; Katayama, Keiichi ; Zhang, Yingjiu ; Utsuno, Futoshi ; Sugahara, Yoshiyuki ; Koya, Kazuo ; Fujinoki, Akira ; Tawarayama, Hiromasa ; Kawazoe, Hiroshi. / Smoothing of surface of silica glass by heat treatment in wet atmosphere. In: Journal of Applied Physics. 2011 ; Vol. 109, No. 10.
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