Sn electrodeposition process for fabricating microabsorber arrays for an X-ray microcalorimeter

Takayuki Homma, Hirotaka Sato, Hideomi Kobayashi, Takahiro Arakawa, Hiroyuki Kudo, Testuya Osaka, Shuichi Shoji, Yoshitaka Ishisaki, Tai Oshima, Naoko Iyomoto, Ryuichi Fujimoto, Kazuhisa Mitsuda

Research output: Contribution to journalConference article

11 Citations (Scopus)


Sn electrodeposition was employed for fabricating an array of microabsorbers with a 'mushroom-shaped' microstructure for a precision X-ray microdetector, the so called X-ray microcalorimeter. A deposition process for flat and smooth Sn films, which was suitable for the use of the absorber material, was developed by optimizing the conditions of additives such as o-cresol-4-sulfonic acid and polyethyleneglycol (PEG) to the Sn bath. The Sn films exhibited suitable properties, i.e. a higher superconducting transition temperature than the operating temperature of the X-ray microcalorimeter. The mushroom-shaped absorber array was successfully fabricated by Sn electrodeposition in combination with a photolithographic technique.

Original languageEnglish
Pages (from-to)143-148
Number of pages6
JournalJournal of Electroanalytical Chemistry
Publication statusPublished - 2003 Nov 15
EventInternational Symposium on Materials Processing for Nonstruct (MPND2001) - Kyoto, Japan
Duration: 2001 Sep 162001 Sep 19



  • Electrodeposition
  • Microfabrication
  • Pattern formation
  • Surfactant
  • Three-dimensional microstructure
  • X-ray microcalorimeter

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

Cite this

Homma, T., Sato, H., Kobayashi, H., Arakawa, T., Kudo, H., Osaka, T., Shoji, S., Ishisaki, Y., Oshima, T., Iyomoto, N., Fujimoto, R., & Mitsuda, K. (2003). Sn electrodeposition process for fabricating microabsorber arrays for an X-ray microcalorimeter. Journal of Electroanalytical Chemistry, 559, 143-148.