SOBINMF for automatic removal of ocular artifacts from the EEG

Hirohisa Tsubakida; Yumie Ono; Atsushi Ishiyama

doi:10.1541/ieejeiss.135.954

SOBINMF for automatic removal of ocular artifacts from the EEG

Hirohisa Tsubakida, Yumie Ono, Atsushi Ishiyama

Research output: Contribution to journal › Article › peer-review

Abstract

This paper introduces a novel method to automatically remove electro-oculogram (EOG) from electroencephalogram (EEG) using second-order blind identification (SOBI) and nonnegative matrix factorization (NMF). To demonstrate the effectiveness of the proposed method, we applied SOBI, NMF, or combined SOBI and NMF (SOBINMF) to the EEG data during motor imagery task in which participants imagined moving their left or right hand. Ocular artifacts were removed more effectively in our proposed SOBINMF method compared to SOBI or NMF alone.

Original language	English
Pages (from-to)	954-962
Number of pages	9
Journal	IEEJ Transactions on Electronics, Information and Systems
Volume	135
Issue number	8
DOIs	https://doi.org/10.1541/ieejeiss.135.954
Publication status	Published - 2015 Aug 1

Keywords

Electro-oculogram artifact
Electroencephalogram
Nonnegative matrix factorization
Second order blind identification

ASJC Scopus subject areas

Electrical and Electronic Engineering

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AU - Ono, Yumie

AU - Ishiyama, Atsushi

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AB - This paper introduces a novel method to automatically remove electro-oculogram (EOG) from electroencephalogram (EEG) using second-order blind identification (SOBI) and nonnegative matrix factorization (NMF). To demonstrate the effectiveness of the proposed method, we applied SOBI, NMF, or combined SOBI and NMF (SOBINMF) to the EEG data during motor imagery task in which participants imagined moving their left or right hand. Ocular artifacts were removed more effectively in our proposed SOBINMF method compared to SOBI or NMF alone.

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KW - Electroencephalogram

KW - Nonnegative matrix factorization

KW - Second order blind identification

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