SOBINMF for automatic removal of ocular artifacts from the EEG

Hirohisa Tsubakida, Yumie Ono, Atsushi Ishiyama

    Research output: Contribution to journalArticle

    Abstract

    This paper introduces a novel method to automatically remove electro-oculogram (EOG) from electroencephalogram (EEG) using second-order blind identification (SOBI) and nonnegative matrix factorization (NMF). To demonstrate the effectiveness of the proposed method, we applied SOBI, NMF, or combined SOBI and NMF (SOBINMF) to the EEG data during motor imagery task in which participants imagined moving their left or right hand. Ocular artifacts were removed more effectively in our proposed SOBINMF method compared to SOBI or NMF alone.

    Original languageEnglish
    Pages (from-to)954-962
    Number of pages9
    JournalIEEJ Transactions on Electronics, Information and Systems
    Volume135
    Issue number8
    DOIs
    Publication statusPublished - 2015 Aug 1

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    Keywords

    • Electro-oculogram artifact
    • Electroencephalogram
    • Nonnegative matrix factorization
    • Second order blind identification

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

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