Spatial distribution of defects in high-purity silica glasses

Ryoichi Tohmon, Akihiro Ikeda, Yasushi Shimogaichi, Shuji Munekuni, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama

    Research output: Contribution to journalArticle

    15 Citations (Scopus)

    Abstract

    The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.

    Original languageEnglish
    Pages (from-to)1302-1306
    Number of pages5
    JournalJournal of Applied Physics
    Volume67
    Issue number3
    DOIs
    Publication statusPublished - 1990

    Fingerprint

    silica glass
    spatial distribution
    purity
    defects
    ionizing radiation
    ultraviolet radiation
    oxygen
    linkages
    activation
    silicon dioxide
    impurities
    glass
    geometry

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Tohmon, R., Ikeda, A., Shimogaichi, Y., Munekuni, S., Ohki, Y., Nagasawa, K., & Hama, Y. (1990). Spatial distribution of defects in high-purity silica glasses. Journal of Applied Physics, 67(3), 1302-1306. https://doi.org/10.1063/1.345681

    Spatial distribution of defects in high-purity silica glasses. / Tohmon, Ryoichi; Ikeda, Akihiro; Shimogaichi, Yasushi; Munekuni, Shuji; Ohki, Yoshimichi; Nagasawa, Kaya; Hama, Yoshimasa.

    In: Journal of Applied Physics, Vol. 67, No. 3, 1990, p. 1302-1306.

    Research output: Contribution to journalArticle

    Tohmon, R, Ikeda, A, Shimogaichi, Y, Munekuni, S, Ohki, Y, Nagasawa, K & Hama, Y 1990, 'Spatial distribution of defects in high-purity silica glasses', Journal of Applied Physics, vol. 67, no. 3, pp. 1302-1306. https://doi.org/10.1063/1.345681
    Tohmon R, Ikeda A, Shimogaichi Y, Munekuni S, Ohki Y, Nagasawa K et al. Spatial distribution of defects in high-purity silica glasses. Journal of Applied Physics. 1990;67(3):1302-1306. https://doi.org/10.1063/1.345681
    Tohmon, Ryoichi ; Ikeda, Akihiro ; Shimogaichi, Yasushi ; Munekuni, Shuji ; Ohki, Yoshimichi ; Nagasawa, Kaya ; Hama, Yoshimasa. / Spatial distribution of defects in high-purity silica glasses. In: Journal of Applied Physics. 1990 ; Vol. 67, No. 3. pp. 1302-1306.
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