Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam

H. Nishikawa, K. Fukagawa, T. Nakamura, Yoshimichi Ohki, M. Oikawa, T. Kamiya, K. Arakawa

    Research output: Contribution to journalArticle

    8 Citations (Scopus)

    Abstract

    High-purity silica glass was irradiated by a focused 15-MeV O4+ microbeam with diameter of 1 μm up to a fluence of 1.0 × 10 14 ions/cm2. Spatial distribution of irradiation effects by the O4+ microbeam on silica glass was investigated by optical microscopy, microphotoluminescence (PL)/Raman spectroscopy and atomic force microscopy (AFM). Distribution of refractive index change and defect formation was visualized by optical microscopy and PL mapping, indicating the structural changes of silica glass along the ion track up to the depth of 10 μm. In addition, we observed deformed side surface with a groove by AFM along the track suggesting the internal compaction in silica glass. This is accompanied by increased threefold rings of SiO2 network detected by Raman scattering. We also discuss technological implications of these results on the applications of microbeam irradiation effects to the fabrication of microoptical elements.

    Original languageEnglish
    Pages (from-to)437-440
    Number of pages4
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume242
    Issue number1-2
    DOIs
    Publication statusPublished - 2006 Jan

    Fingerprint

    microbeams
    silica glass
    Fused silica
    oxygen ions
    Spatial distribution
    spatial distribution
    Irradiation
    Ions
    Oxygen
    irradiation
    Optical microscopy
    Atomic force microscopy
    atomic force microscopy
    microscopy
    grooves
    Raman spectroscopy
    Raman scattering
    Refractive index
    fluence
    ions

    Keywords

    • Atomic force microscopy
    • Ion microbeam
    • Photoluminescence
    • Raman scattering
    • Silica

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Instrumentation
    • Surfaces and Interfaces

    Cite this

    Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam. / Nishikawa, H.; Fukagawa, K.; Nakamura, T.; Ohki, Yoshimichi; Oikawa, M.; Kamiya, T.; Arakawa, K.

    In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 242, No. 1-2, 01.2006, p. 437-440.

    Research output: Contribution to journalArticle

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    AU - Fukagawa, K.

    AU - Nakamura, T.

    AU - Ohki, Yoshimichi

    AU - Oikawa, M.

    AU - Kamiya, T.

    AU - Arakawa, K.

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