Spatial variability in large area single and few-layer CVD graphene

Clara F. Moldovan, Krzysztof Gajewski, Michele Tamagnone, Robert S. Weatherup, Hisashi Sugime, Anna Szumska, Wolfgang A. Vitale, John Robertson, Adrian M. Ionescu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Variability in graphene can result from the material synthesis or post-processing steps as well as the surrounding environment. This is a critical issue for the performance of large area devices as well as for the large-scale production of micro- and nano-scale graphene devices, leading to low yield and reliability. The aim of this study is to investigate variability of single and few-layer graphene structures, on different substrates, and the effects it has on its electronic properties. We demonstrate a combination of Kelvin probe force microscopy (KPFM) and non-contact Fourier transform infrared spectroscopy (FTIR) measurements for centimeter-scale quantitative mapping of the electrical variability of large-area chemical vapor deposited graphene films. KPFM provides statistical insight into the influence of micro-scale defects on the surface potential, while FTIR gives the spatially averaged chemical potential of the graphene structures. Test structures consisting of single-, bi- and few-layer graphene on SÌO2 and AI2O3 were fabricated and analyzed.

Original languageEnglish
Title of host publicationEUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages85-88
Number of pages4
ISBN (Electronic)9781479969111
DOIs
Publication statusPublished - 2015 Mar 18
Externally publishedYes
Event2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015 - Bologna, Italy
Duration: 2015 Jan 262015 Jan 28

Other

Other2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015
CountryItaly
CityBologna
Period15/1/2615/1/28

Fingerprint

Graphene
Chemical vapor deposition
Fourier transform infrared spectroscopy
Microscopic examination
Chemical potential
Surface potential
Electronic properties
Vapors
Defects
Substrates
Processing

Keywords

  • bilayer
  • CVD
  • Fermi level
  • FTIR
  • graphene
  • KPFM
  • large-scale devices
  • multilayer
  • substrate
  • variability

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Moldovan, C. F., Gajewski, K., Tamagnone, M., Weatherup, R. S., Sugime, H., Szumska, A., ... Ionescu, A. M. (2015). Spatial variability in large area single and few-layer CVD graphene. In EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (pp. 85-88). [7063779] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ULIS.2015.7063779

Spatial variability in large area single and few-layer CVD graphene. / Moldovan, Clara F.; Gajewski, Krzysztof; Tamagnone, Michele; Weatherup, Robert S.; Sugime, Hisashi; Szumska, Anna; Vitale, Wolfgang A.; Robertson, John; Ionescu, Adrian M.

EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc., 2015. p. 85-88 7063779.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Moldovan, CF, Gajewski, K, Tamagnone, M, Weatherup, RS, Sugime, H, Szumska, A, Vitale, WA, Robertson, J & Ionescu, AM 2015, Spatial variability in large area single and few-layer CVD graphene. in EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon., 7063779, Institute of Electrical and Electronics Engineers Inc., pp. 85-88, 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015, Bologna, Italy, 15/1/26. https://doi.org/10.1109/ULIS.2015.7063779
Moldovan CF, Gajewski K, Tamagnone M, Weatherup RS, Sugime H, Szumska A et al. Spatial variability in large area single and few-layer CVD graphene. In EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc. 2015. p. 85-88. 7063779 https://doi.org/10.1109/ULIS.2015.7063779
Moldovan, Clara F. ; Gajewski, Krzysztof ; Tamagnone, Michele ; Weatherup, Robert S. ; Sugime, Hisashi ; Szumska, Anna ; Vitale, Wolfgang A. ; Robertson, John ; Ionescu, Adrian M. / Spatial variability in large area single and few-layer CVD graphene. EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc., 2015. pp. 85-88
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