Spatial variability in large area single and few-layer CVD graphene

Clara F. Moldovan; Krzysztof Gajewski; Michele Tamagnone; Robert S. Weatherup; Hisashi Sugime; Anna Szumska; Wolfgang A. Vitale; John Robertson; Adrian M. Ionescu

doi:10.1109/ULIS.2015.7063779

Spatial variability in large area single and few-layer CVD graphene

Clara F. Moldovan, Krzysztof Gajewski, Michele Tamagnone, Robert S. Weatherup, Hisashi Sugime, Anna Szumska, Wolfgang A. Vitale, John Robertson, Adrian M. Ionescu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

Variability in graphene can result from the material synthesis or post-processing steps as well as the surrounding environment. This is a critical issue for the performance of large area devices as well as for the large-scale production of micro- and nano-scale graphene devices, leading to low yield and reliability. The aim of this study is to investigate variability of single and few-layer graphene structures, on different substrates, and the effects it has on its electronic properties. We demonstrate a combination of Kelvin probe force microscopy (KPFM) and non-contact Fourier transform infrared spectroscopy (FTIR) measurements for centimeter-scale quantitative mapping of the electrical variability of large-area chemical vapor deposited graphene films. KPFM provides statistical insight into the influence of micro-scale defects on the surface potential, while FTIR gives the spatially averaged chemical potential of the graphene structures. Test structures consisting of single-, bi- and few-layer graphene on SÌO2 and AI2O3 were fabricated and analyzed.

Original language	English
Title of host publication	EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	85-88
Number of pages	4
ISBN (Electronic)	9781479969111
DOIs	https://doi.org/10.1109/ULIS.2015.7063779
Publication status	Published - 2015 Mar 18
Externally published	Yes
Event	2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015 - Bologna, Italy Duration: 2015 Jan 26 → 2015 Jan 28

Other

Other	2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015
Country	Italy
City	Bologna
Period	15/1/26 → 15/1/28

Fingerprint

Keywords

bilayer
CVD
Fermi level
FTIR
graphene
KPFM
large-scale devices
multilayer
substrate
variability

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

Moldovan, C. F., Gajewski, K., Tamagnone, M., Weatherup, R. S., Sugime, H., Szumska, A., Vitale, W. A., Robertson, J., & Ionescu, A. M. (2015). Spatial variability in large area single and few-layer CVD graphene. In EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (pp. 85-88). [7063779] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ULIS.2015.7063779

Spatial variability in large area single and few-layer CVD graphene. / Moldovan, Clara F.; Gajewski, Krzysztof; Tamagnone, Michele; Weatherup, Robert S.; Sugime, Hisashi; Szumska, Anna; Vitale, Wolfgang A.; Robertson, John; Ionescu, Adrian M.

EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc., 2015. p. 85-88 7063779.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Moldovan, CF, Gajewski, K, Tamagnone, M, Weatherup, RS, Sugime, H, Szumska, A, Vitale, WA, Robertson, J & Ionescu, AM 2015, Spatial variability in large area single and few-layer CVD graphene. in EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon., 7063779, Institute of Electrical and Electronics Engineers Inc., pp. 85-88, 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015, Bologna, Italy, 15/1/26. https://doi.org/10.1109/ULIS.2015.7063779

Moldovan CF, Gajewski K, Tamagnone M, Weatherup RS, Sugime H, Szumska A et al. Spatial variability in large area single and few-layer CVD graphene. In EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc. 2015. p. 85-88. 7063779 https://doi.org/10.1109/ULIS.2015.7063779

Moldovan, Clara F. ; Gajewski, Krzysztof ; Tamagnone, Michele ; Weatherup, Robert S. ; Sugime, Hisashi ; Szumska, Anna ; Vitale, Wolfgang A. ; Robertson, John ; Ionescu, Adrian M. / Spatial variability in large area single and few-layer CVD graphene. EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon. Institute of Electrical and Electronics Engineers Inc., 2015. pp. 85-88

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AU - Vitale, Wolfgang A.

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Access to Document

10.1109/ULIS.2015.7063779