Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12

Yoshikazu Teranishi, Kouji Kondou, Yukio Fujiwara, Hidehiko Nonaka, Toshiyuki Fujimoto, Shingo Ichimura, Misuhiro Tomita

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However, the sputtered surface roughness behavior against the incident angle of the ion beam show strong dependence to the accelerating energy of the cluster ions, which could be explained by the balance between the sputtering effect and deposition of ions themselves.

Original languageEnglish
Pages (from-to)670-676
Number of pages7
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume257
Issue number1-2 SPEC. ISS.
DOIs
Publication statusPublished - 2007 Apr 1
Externally publishedYes

Fingerprint

metal clusters
Carbon Monoxide
Sputtering
sputtering
Metals
Ion sources
Ions
ions
ion sources
Ion beams
Auger spectroscopy
surface roughness
Microscopes
Surface roughness
ion beams
microscopes
Spectroscopy
energy

Keywords

  • AFM
  • Ion cluster
  • Roughness
  • Sputter

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12 . / Teranishi, Yoshikazu; Kondou, Kouji; Fujiwara, Yukio; Nonaka, Hidehiko; Fujimoto, Toshiyuki; Ichimura, Shingo; Tomita, Misuhiro.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 257, No. 1-2 SPEC. ISS., 01.04.2007, p. 670-676.

Research output: Contribution to journalArticle

Teranishi, Yoshikazu ; Kondou, Kouji ; Fujiwara, Yukio ; Nonaka, Hidehiko ; Fujimoto, Toshiyuki ; Ichimura, Shingo ; Tomita, Misuhiro. / Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12 In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2007 ; Vol. 257, No. 1-2 SPEC. ISS. pp. 670-676.
@article{54d0c450bc82476eb984aa9c8f30be42,
title = "Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12",
abstract = "The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However, the sputtered surface roughness behavior against the incident angle of the ion beam show strong dependence to the accelerating energy of the cluster ions, which could be explained by the balance between the sputtering effect and deposition of ions themselves.",
keywords = "AFM, Ion cluster, Roughness, Sputter",
author = "Yoshikazu Teranishi and Kouji Kondou and Yukio Fujiwara and Hidehiko Nonaka and Toshiyuki Fujimoto and Shingo Ichimura and Misuhiro Tomita",
year = "2007",
month = "4",
day = "1",
doi = "10.1016/j.nimb.2007.01.268",
language = "English",
volume = "257",
pages = "670--676",
journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",
issn = "0168-583X",
publisher = "Elsevier",
number = "1-2 SPEC. ISS.",

}

TY - JOUR

T1 - Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12

AU - Teranishi, Yoshikazu

AU - Kondou, Kouji

AU - Fujiwara, Yukio

AU - Nonaka, Hidehiko

AU - Fujimoto, Toshiyuki

AU - Ichimura, Shingo

AU - Tomita, Misuhiro

PY - 2007/4/1

Y1 - 2007/4/1

N2 - The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However, the sputtered surface roughness behavior against the incident angle of the ion beam show strong dependence to the accelerating energy of the cluster ions, which could be explained by the balance between the sputtering effect and deposition of ions themselves.

AB - The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However, the sputtered surface roughness behavior against the incident angle of the ion beam show strong dependence to the accelerating energy of the cluster ions, which could be explained by the balance between the sputtering effect and deposition of ions themselves.

KW - AFM

KW - Ion cluster

KW - Roughness

KW - Sputter

UR - http://www.scopus.com/inward/record.url?scp=33947717730&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33947717730&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2007.01.268

DO - 10.1016/j.nimb.2007.01.268

M3 - Article

VL - 257

SP - 670

EP - 676

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

IS - 1-2 SPEC. ISS.

ER -