Abstract
We investigated (i) the relationship between the spatiotemporal pattern of a deformed adhesive and peel load during peeling, and (ii) the dependence of the pattern formation on peel speed in the hard spring limit case. In the hard spring limit case, it is found that elastic and viscous peeling states coexist. It is also found that the occupation ratio of tunnel structures in a separation front is determined by the peel speed and is a monotonically decreasing function of peel speed. We experimentally confirmed that the value of peel load has a linear dependence on the occupation ratio of tunnel structures. An explanation of dynamical behavior is also given on the basis of the creation-annihilation dynamics of tunnel structures.
Original language | English |
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Pages (from-to) | 2342-2346 |
Number of pages | 5 |
Journal | journal of the physical society of japan |
Volume | 73 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2004 Aug 1 |
Keywords
- Adhesion
- Pattern formation
- Peeling process
- Phase diagram
- State variable
- Tunnel formation
- Viscoelastic behavior
ASJC Scopus subject areas
- Physics and Astronomy(all)