Stranski-Krastanov growth of tungsten during chemical vapor deposition revealed by micro-auger electron spectroscopy

Suguru Noda, Takeshi Tsumura, Jota Fukuhara, Takashi Yoda, Hiroshi Komiyama, Yukihiro Shimogaki

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Chemical vapor deposition (CVD) of tungsten is an important process to make interconnections in advanced integrated-circuit devices. As device dimensions continue to decrease, incomplete nucleation inside the trenches and via holes is becoming a crucial issue. In this work, micro-Auger electron spectroscopy with in-plane spatial resolution was applied for the first time to study the nucleation and growth process of W islands. Results showed that W grew slowly and uniformly on TiN surfaces up to about one-monolayer coverage, and then W islands nucleated and started to grow rapidly. This transition from layer to island shows that W grew by Stranski-Krastanov mode during CVD on TiN from WF6 and SiH4. Drastic difference might exist in chemical reactivity between the initial W layer on TiN surfaces and the W islands, causing the change in W growth rate.

Original languageEnglish
Pages (from-to)6974-6977
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number10
DOIs
Publication statusPublished - 2004 Oct
Externally publishedYes

Fingerprint

Auger electron spectroscopy
Auger spectroscopy
electron spectroscopy
Tungsten
Chemical vapor deposition
tungsten
Nucleation
vapor deposition
Chemical reactivity
Integrated circuits
Monolayers
nucleation
integrated circuits
reactivity
spatial resolution

Keywords

  • Chemical vapor deposition
  • Micro-auger electron spectroscopy
  • Nucleation and growth
  • Stranski-Krastanov growth
  • Titanium nitride
  • Tungsten

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Stranski-Krastanov growth of tungsten during chemical vapor deposition revealed by micro-auger electron spectroscopy. / Noda, Suguru; Tsumura, Takeshi; Fukuhara, Jota; Yoda, Takashi; Komiyama, Hiroshi; Shimogaki, Yukihiro.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 10, 10.2004, p. 6974-6977.

Research output: Contribution to journalArticle

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