Stress release drives growth transition of quaterrylene thin films on Sio2 surfaces

Ryoma Hayakawa, XueNa Zhang, Helmut Dosch, Nobuya Hiroshiba, Toyohiro Chikyow, Yutaka Wakayama

Research output: Contribution to journalArticle

10 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy