Structural analysis of metal-surface protect surfactants by tandem mass spectrometry

Hisashi Kambe, Toshimichi Shibue, Izumi Hirasawa

    Research output: Contribution to journalArticle

    Abstract

    The applicability of tandem mass spectrometry to the quality analysis of metal-surface protect surfactants without any pretreatment or purification of the sample solution was investigated. Three typical spectra were constructed and verified by FAB CID-MS/MS using sodium n-dodecylsulfate (anionic surfactant), tetradecyl dimethylbenzylammonium chloride (cationic surfactant) and heptaethylene glycol mono-n-dodecyl ether (nonionic surfactant) as a model. The FAB CID-MS/MS spectra of metal-surface protect surfactants provided useful structural information that analyte surfactants have a polyoxyethylene structure, which has been identified as a nonionic surfactant. The authors concluded that FAB CID-MS/MS will be a good analytical method for direct quality analysis without any pretreatment or purification of the metal-surface protect surfactant for industrial use.

    Original languageEnglish
    Pages (from-to)797
    Number of pages1
    JournalBunseki Kagaku
    Volume48
    Issue number8
    Publication statusPublished - 1999

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    Keywords

    • Charge-remote fragmentation
    • Fast atom bombardment
    • Mass spectrometry
    • Surfactant
    • Tandem mass spectrometry

    ASJC Scopus subject areas

    • Analytical Chemistry

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