Structural and morphological control of nanosized Cu islands on SiO 2 using a Ti underlayer

Minghui Hu, Suguru Noda, Tatsuya Okubo, Yukio Yamaguchi, Hiroshi Komiyama

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The structural and morphological control of nanosized Cu islands on SiO2 using a Ti underlayer were discussed. It was found that the Cu islands on Ti/SiO2 possessed smaller sizes, shorter interisland distance and a higher number density that those on SiO2. The analysis suggested the fabrication of nanosized islands with the desired wettability and crystalline orientation using an appropriate metal underlayer.

Original languageEnglish
Pages (from-to)3492-3497
Number of pages6
JournalJournal of Applied Physics
Volume94
Issue number5
DOIs
Publication statusPublished - 2003 Sep 1
Externally publishedYes

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wettability
fabrication
metals

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Structural and morphological control of nanosized Cu islands on SiO 2 using a Ti underlayer. / Hu, Minghui; Noda, Suguru; Okubo, Tatsuya; Yamaguchi, Yukio; Komiyama, Hiroshi.

In: Journal of Applied Physics, Vol. 94, No. 5, 01.09.2003, p. 3492-3497.

Research output: Contribution to journalArticle

Hu, Minghui ; Noda, Suguru ; Okubo, Tatsuya ; Yamaguchi, Yukio ; Komiyama, Hiroshi. / Structural and morphological control of nanosized Cu islands on SiO 2 using a Ti underlayer. In: Journal of Applied Physics. 2003 ; Vol. 94, No. 5. pp. 3492-3497.
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