Structural defects in amorphous silicon oxynitride and silicon nitride

H. Kato, Y. Ohki

Research output: Contribution to journalReview articlepeer-review

1 Citation (Scopus)

Abstract

Amorphous silicon oxynitride and silicon nitride have been gaining each important position as a material used in electronic and optoelectronic devices. The present paper gives a review of structural defects in these materials, focusing on their characterization by photoluminescence and electron spin resonance. Some typical effects induced in these materials by the presence of hydrogen, the irradiation of ultraviolet photons and application of a high electric field are also discussed.

Original languageEnglish
Pages (from-to)39-49
Number of pages11
JournalDefect and Diffusion Forum
Volume218-220
DOIs
Publication statusPublished - 2003 Jan 1

Keywords

  • Amorphous Materials
  • Band-Tail States
  • Paramagnetic Defects
  • Photoluminescence
  • Poole-Frenkel Conduction
  • Static Disorder

ASJC Scopus subject areas

  • Radiation
  • Materials Science(all)
  • Condensed Matter Physics

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