Structural studies of copper sulfide films: Effect of ambient atmosphere

Manisha Kundu, Tsuyoshi Hasegawa, Kazuya Terabe, Kazuhiro Yamamoto, Masakazu Aono

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47 Citations (Scopus)

Abstract

We examined the structural properties of copper sulfide films as a function of the sulfurization time of 70-nm-thick Cu films. Copper sulfide films with various phases such as mixed metallic Cu-chalcocite, chalcocite, roxbyite, and covellite phases were formed with increasing sulfurization time. To evaluate the structural stability of various films, all the films were exposed to the ambient atmosphere for the same amount of time. Although the phase structure and stoichiometry of the films were maintained at a greater depth, the near-surface region of the films was oxidized and covered with overlayers of oxide, hydroxide, and/or sulfate species due to the exposure and reaction with the ambient atmosphere. The oxygen uptake and its reactivity with the copper sulfide film surfaces were enhanced with increasing sulfur content of the films. In addition, the type of divalent state of copper formed on the film surfaces depended on the phase structure, composition, and stoichiometry of the films.

Original languageEnglish
Article number035011
JournalScience and Technology of Advanced Materials
Volume9
Issue number3
DOIs
Publication statusPublished - 2008 Jul 1
Externally publishedYes

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Keywords

  • Copper sulfide
  • X-ray diffraction
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Materials Science(all)

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