Abstract
FeP and FeCuP alloys have been prepared by pulsed galvanostatic electrodeposition from a sulphuric acid solution. A current pulse, with a height of 100 mA cm-2 and on and off time durations of 100 ms, was found to be most effective for the formation of FeP amorphous alloy. The composition range of the plating solution giving an amorphous structure was wider for pulse plating than for direct current plating. Most of the pulse-plated amorphous alloys contained about 20 at.% P and their lowest coercive force (Hc) was about 0.2 Oe. The pulse-plated FeCuP ternary alloy was deposited even at a high pulse current density of 1 A cm-2. The alloy formed at 300 mA cm-2 showed the lowest Hc of 0.5 Oe. Cross-sectional scanning electron microscopy examination of the pulse-plated FeCuP alloy revealed a very fine multilayered structure.
| Original language | English |
|---|---|
| Pages (from-to) | 906-910 |
| Number of pages | 5 |
| Journal | Materials Science and Engineering A |
| Volume | 181-182 |
| Issue number | C |
| DOIs | |
| Publication status | Published - 1994 May 15 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Materials Science(all)
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Structure and magnetic properties of pulse-plated FeP and FeCuP amorphous alloys. / Kamei, K.; Maehara, Y.
In: Materials Science and Engineering A, Vol. 181-182, No. C, 15.05.1994, p. 906-910.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Structure and magnetic properties of pulse-plated FeP and FeCuP amorphous alloys
AU - Kamei, K.
AU - Maehara, Y.
PY - 1994/5/15
Y1 - 1994/5/15
N2 - FeP and FeCuP alloys have been prepared by pulsed galvanostatic electrodeposition from a sulphuric acid solution. A current pulse, with a height of 100 mA cm-2 and on and off time durations of 100 ms, was found to be most effective for the formation of FeP amorphous alloy. The composition range of the plating solution giving an amorphous structure was wider for pulse plating than for direct current plating. Most of the pulse-plated amorphous alloys contained about 20 at.% P and their lowest coercive force (Hc) was about 0.2 Oe. The pulse-plated FeCuP ternary alloy was deposited even at a high pulse current density of 1 A cm-2. The alloy formed at 300 mA cm-2 showed the lowest Hc of 0.5 Oe. Cross-sectional scanning electron microscopy examination of the pulse-plated FeCuP alloy revealed a very fine multilayered structure.
AB - FeP and FeCuP alloys have been prepared by pulsed galvanostatic electrodeposition from a sulphuric acid solution. A current pulse, with a height of 100 mA cm-2 and on and off time durations of 100 ms, was found to be most effective for the formation of FeP amorphous alloy. The composition range of the plating solution giving an amorphous structure was wider for pulse plating than for direct current plating. Most of the pulse-plated amorphous alloys contained about 20 at.% P and their lowest coercive force (Hc) was about 0.2 Oe. The pulse-plated FeCuP ternary alloy was deposited even at a high pulse current density of 1 A cm-2. The alloy formed at 300 mA cm-2 showed the lowest Hc of 0.5 Oe. Cross-sectional scanning electron microscopy examination of the pulse-plated FeCuP alloy revealed a very fine multilayered structure.
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UR - http://www.scopus.com/inward/citedby.url?scp=0028429615&partnerID=8YFLogxK
U2 - 10.1016/0921-5093(94)90767-6
DO - 10.1016/0921-5093(94)90767-6
M3 - Article
AN - SCOPUS:0028429615
VL - 181-182
SP - 906
EP - 910
JO - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
JF - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
SN - 0921-5093
IS - C
ER -