Structure of hetero-epitaxial nickel film on iron-substrate by electrodeposition

Kazuhito Kamei

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

With special attention to the fine structure of Ni film and the structure of Ni/a-Fe interface, the hetero-epitaxial growth of Ni electrodeposits on polycrystalline a-Fe has been studied mainly by transmission electron microscopy. (1) Ni grows hetero-epitaxially even under a high current density as 500 A/m2 on a cleaned substrate surface. (2) The crystallographic orientation relationship between Ni deposits and the substrate a-Fe is almost the same as that of the Kurdjumov-Sachs relationship. (3) the Ni hetero-epitaxial film consists of columnar crystals which grow in the direction and contains dislocations and stacking faults with high density. (4) These defects are introduced in order to decrease the elastic strain caused by the misfit between Ni and a-Fe at the interface. The number of defects decreases with increasing film thickness.

Original languageEnglish
Pages (from-to)743-748
Number of pages6
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Volume52
Issue number8
Publication statusPublished - 1988 Aug
Externally publishedYes

Fingerprint

Nickel
Electrodeposition
electrodeposition
Iron
nickel
iron
Defects
Epitaxial films
defects
Stacking faults
Substrates
Dislocations (crystals)
Epitaxial growth
crystal defects
high current
Film thickness
film thickness
Current density
Deposits
fine structure

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Structure of hetero-epitaxial nickel film on iron-substrate by electrodeposition. / Kamei, Kazuhito.

In: Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, Vol. 52, No. 8, 08.1988, p. 743-748.

Research output: Contribution to journalArticle

@article{6a8306b88a46419b9c0ba6c393f06d36,
title = "Structure of hetero-epitaxial nickel film on iron-substrate by electrodeposition",
abstract = "With special attention to the fine structure of Ni film and the structure of Ni/a-Fe interface, the hetero-epitaxial growth of Ni electrodeposits on polycrystalline a-Fe has been studied mainly by transmission electron microscopy. (1) Ni grows hetero-epitaxially even under a high current density as 500 A/m2 on a cleaned substrate surface. (2) The crystallographic orientation relationship between Ni deposits and the substrate a-Fe is almost the same as that of the Kurdjumov-Sachs relationship. (3) the Ni hetero-epitaxial film consists of columnar crystals which grow in the direction and contains dislocations and stacking faults with high density. (4) These defects are introduced in order to decrease the elastic strain caused by the misfit between Ni and a-Fe at the interface. The number of defects decreases with increasing film thickness.",
author = "Kazuhito Kamei",
year = "1988",
month = "8",
language = "English",
volume = "52",
pages = "743--748",
journal = "Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals",
issn = "0021-4876",
publisher = "Japan Institute of Metals (JIM)",
number = "8",

}

TY - JOUR

T1 - Structure of hetero-epitaxial nickel film on iron-substrate by electrodeposition

AU - Kamei, Kazuhito

PY - 1988/8

Y1 - 1988/8

N2 - With special attention to the fine structure of Ni film and the structure of Ni/a-Fe interface, the hetero-epitaxial growth of Ni electrodeposits on polycrystalline a-Fe has been studied mainly by transmission electron microscopy. (1) Ni grows hetero-epitaxially even under a high current density as 500 A/m2 on a cleaned substrate surface. (2) The crystallographic orientation relationship between Ni deposits and the substrate a-Fe is almost the same as that of the Kurdjumov-Sachs relationship. (3) the Ni hetero-epitaxial film consists of columnar crystals which grow in the direction and contains dislocations and stacking faults with high density. (4) These defects are introduced in order to decrease the elastic strain caused by the misfit between Ni and a-Fe at the interface. The number of defects decreases with increasing film thickness.

AB - With special attention to the fine structure of Ni film and the structure of Ni/a-Fe interface, the hetero-epitaxial growth of Ni electrodeposits on polycrystalline a-Fe has been studied mainly by transmission electron microscopy. (1) Ni grows hetero-epitaxially even under a high current density as 500 A/m2 on a cleaned substrate surface. (2) The crystallographic orientation relationship between Ni deposits and the substrate a-Fe is almost the same as that of the Kurdjumov-Sachs relationship. (3) the Ni hetero-epitaxial film consists of columnar crystals which grow in the direction and contains dislocations and stacking faults with high density. (4) These defects are introduced in order to decrease the elastic strain caused by the misfit between Ni and a-Fe at the interface. The number of defects decreases with increasing film thickness.

UR - http://www.scopus.com/inward/record.url?scp=0024054651&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0024054651&partnerID=8YFLogxK

M3 - Article

VL - 52

SP - 743

EP - 748

JO - Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

JF - Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

SN - 0021-4876

IS - 8

ER -