Study on direct etching of poly(tetrafluoroethylene) by high-energy heavy ion beams

Hidehiro Tsubokura, Akihiro Oshima, Tomoko G. Oyama, Yuya Takasawa, Naoyuki Fukutake, Satoshi Okubo, Taeko Yoshikawa, Toshitaka Oka, Takeshi Murakami, Yoshimasa Hama, Masakazu Washio

    Research output: Contribution to journalArticle

    3 Citations (Scopus)

    Abstract

    Micro-fabrication of poly(tetrafluoroethylene) (PTFE) was carried out using a high-energy heavy ion beam in the MeV region. PTFE was irradiated with various ions (6MeV/u) under vacuum (<1.0×10-4Pa) at room temperature (298K). The surface of the irradiated PTFE was observed by laser microscopy and a scanning electron microscope (SEM). Micro-scale fabrications of PTFE were successfully performed by direct ion beam etching. Under our experimental conditions the etching proceeded more effectively by heavy ion beams (larger than N7+), compared with lower-energy ion beams (keV region). A larger atomic number (Z) of the irradiating ion induced higher etching rates in PTFE; the etching rate for Ne10+ and Xe54+ changed from 6.5×10-13 to 2.0×10-11μm/(ioncm-2), respectively. As a result we suggest that due to their high electronic stopping powers, etching could be efficiently achieved using high-energy ion beams.

    Original languageEnglish
    Pages (from-to)37-42
    Number of pages6
    JournalRadiation Physics and Chemistry
    Volume92
    DOIs
    Publication statusPublished - 2013 Nov

    Fingerprint

    polytetrafluoroethylene
    heavy ions
    ion beams
    etching
    energy
    laser microscopy
    fabrication
    stopping power
    ions
    electron microscopes
    vacuum
    scanning
    room temperature
    electronics

    Keywords

    • Direct etching
    • Heavy ion beam
    • LET
    • Micro-fabrication
    • PTFE
    • Stopping power

    ASJC Scopus subject areas

    • Radiation

    Cite this

    Study on direct etching of poly(tetrafluoroethylene) by high-energy heavy ion beams. / Tsubokura, Hidehiro; Oshima, Akihiro; Oyama, Tomoko G.; Takasawa, Yuya; Fukutake, Naoyuki; Okubo, Satoshi; Yoshikawa, Taeko; Oka, Toshitaka; Murakami, Takeshi; Hama, Yoshimasa; Washio, Masakazu.

    In: Radiation Physics and Chemistry, Vol. 92, 11.2013, p. 37-42.

    Research output: Contribution to journalArticle

    Tsubokura, H, Oshima, A, Oyama, TG, Takasawa, Y, Fukutake, N, Okubo, S, Yoshikawa, T, Oka, T, Murakami, T, Hama, Y & Washio, M 2013, 'Study on direct etching of poly(tetrafluoroethylene) by high-energy heavy ion beams', Radiation Physics and Chemistry, vol. 92, pp. 37-42. https://doi.org/10.1016/j.radphyschem.2013.06.020
    Tsubokura, Hidehiro ; Oshima, Akihiro ; Oyama, Tomoko G. ; Takasawa, Yuya ; Fukutake, Naoyuki ; Okubo, Satoshi ; Yoshikawa, Taeko ; Oka, Toshitaka ; Murakami, Takeshi ; Hama, Yoshimasa ; Washio, Masakazu. / Study on direct etching of poly(tetrafluoroethylene) by high-energy heavy ion beams. In: Radiation Physics and Chemistry. 2013 ; Vol. 92. pp. 37-42.
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