Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer

Yuji Hosaka, Takafumi Kondoh, Tomoko Gowa Oyama, Tomoya Uchida, Mitsumasa Taguchi, Yoichi Yoshida, Masakazu Washio

    Research output: Contribution to journalArticle

    Abstract

    α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.

    Original languageEnglish
    Pages (from-to)85-90
    Number of pages6
    JournalJournal of Photopolymer Science and Technology
    Volume31
    Issue number1
    DOIs
    Publication statusPublished - 2018 Jan 1

    Fingerprint

    Acrylics
    Electron beams
    Polymers
    Scavenging
    Polymethyl Methacrylate
    Polymethyl methacrylates
    Radiolysis
    Electrons
    Photopolymerization
    Sealants
    Methylene Chloride
    Dichloromethane
    Ink
    Transparency
    Cations
    Hydrogen
    Rate constants
    Adhesives
    Resins
    Positive ions

    Keywords

    • Electron beam resist
    • Poly(methyl methacrylate)
    • Pulse radiolysis
    • Tetrahydrofuran
    • α-Allyloxymethyl acrylic polymer

    ASJC Scopus subject areas

    • Polymers and Plastics
    • Organic Chemistry
    • Materials Chemistry

    Cite this

    Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer. / Hosaka, Yuji; Kondoh, Takafumi; Oyama, Tomoko Gowa; Uchida, Tomoya; Taguchi, Mitsumasa; Yoshida, Yoichi; Washio, Masakazu.

    In: Journal of Photopolymer Science and Technology, Vol. 31, No. 1, 01.01.2018, p. 85-90.

    Research output: Contribution to journalArticle

    Hosaka, Yuji ; Kondoh, Takafumi ; Oyama, Tomoko Gowa ; Uchida, Tomoya ; Taguchi, Mitsumasa ; Yoshida, Yoichi ; Washio, Masakazu. / Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer. In: Journal of Photopolymer Science and Technology. 2018 ; Vol. 31, No. 1. pp. 85-90.
    @article{a5b79baf97554974b533fa6cf71b774d,
    title = "Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer",
    abstract = "α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.",
    keywords = "Electron beam resist, Poly(methyl methacrylate), Pulse radiolysis, Tetrahydrofuran, α-Allyloxymethyl acrylic polymer",
    author = "Yuji Hosaka and Takafumi Kondoh and Oyama, {Tomoko Gowa} and Tomoya Uchida and Mitsumasa Taguchi and Yoichi Yoshida and Masakazu Washio",
    year = "2018",
    month = "1",
    day = "1",
    doi = "10.2494/photopolymer.31.71",
    language = "English",
    volume = "31",
    pages = "85--90",
    journal = "Journal of Photopolymer Science and Technology",
    issn = "0914-9244",
    publisher = "Tokai University",
    number = "1",

    }

    TY - JOUR

    T1 - Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer

    AU - Hosaka, Yuji

    AU - Kondoh, Takafumi

    AU - Oyama, Tomoko Gowa

    AU - Uchida, Tomoya

    AU - Taguchi, Mitsumasa

    AU - Yoshida, Yoichi

    AU - Washio, Masakazu

    PY - 2018/1/1

    Y1 - 2018/1/1

    N2 - α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.

    AB - α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.

    KW - Electron beam resist

    KW - Poly(methyl methacrylate)

    KW - Pulse radiolysis

    KW - Tetrahydrofuran

    KW - α-Allyloxymethyl acrylic polymer

    UR - http://www.scopus.com/inward/record.url?scp=85053276673&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=85053276673&partnerID=8YFLogxK

    U2 - 10.2494/photopolymer.31.71

    DO - 10.2494/photopolymer.31.71

    M3 - Article

    VL - 31

    SP - 85

    EP - 90

    JO - Journal of Photopolymer Science and Technology

    JF - Journal of Photopolymer Science and Technology

    SN - 0914-9244

    IS - 1

    ER -