Study on formation mechanism of (112̄0) textured Zno films

Takayuki Kawamoto, Mami Matsukawa, Yoshiaki Watanabe, Takahiko Yanagitani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

The ZnO films where crystallites c-axis are unidirectionally aligned in the substrate plane ((112̄0) textured ZnO films) realize shear mode devices. In this study, we have studied the formation mechanism of the (112̄0) textured ZnO film, focusing on the effect of total pressure and partial pressure of oxygen and argon during sputtering deposition. In addition to the X-ray diffraction (XRD) measurement of the films, optical emissions from the RF plasma were analyzed to investigate the effect of ionic species on the growth of the ZnO films. Highly crystallized (112̄0) textured ZnO films were obtained in conditions of low total gas pressure and high oxygen concentration. In these conditions, strong optical emission spectra from oxygen species were strongly observed. The best shear mode electromechanical coupling coefficient k 15 of the film was 0.16, which was 62 % of the value of single crystal.

Original languageEnglish
Title of host publicationProceedings - IEEE Ultrasonics Symposium
Pages1529-1532
Number of pages4
Volume1
DOIs
Publication statusPublished - 2006
Externally publishedYes

Fingerprint

light emission
oxygen
shear
coupling coefficients
crystallites
gas pressure
partial pressure
optical spectrum
emission spectra
sputtering
argon
single crystals
diffraction
x rays

Keywords

  • (112̄0) textured ZnO films; RF magnetron sputtering; optical emission spectroscopy

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

Cite this

Kawamoto, T., Matsukawa, M., Watanabe, Y., & Yanagitani, T. (2006). Study on formation mechanism of (112̄0) textured Zno films. In Proceedings - IEEE Ultrasonics Symposium (Vol. 1, pp. 1529-1532). [4152244] https://doi.org/10.1109/ULTSYM.2006.388

Study on formation mechanism of (112̄0) textured Zno films. / Kawamoto, Takayuki; Matsukawa, Mami; Watanabe, Yoshiaki; Yanagitani, Takahiko.

Proceedings - IEEE Ultrasonics Symposium. Vol. 1 2006. p. 1529-1532 4152244.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kawamoto, T, Matsukawa, M, Watanabe, Y & Yanagitani, T 2006, Study on formation mechanism of (112̄0) textured Zno films. in Proceedings - IEEE Ultrasonics Symposium. vol. 1, 4152244, pp. 1529-1532. https://doi.org/10.1109/ULTSYM.2006.388
Kawamoto T, Matsukawa M, Watanabe Y, Yanagitani T. Study on formation mechanism of (112̄0) textured Zno films. In Proceedings - IEEE Ultrasonics Symposium. Vol. 1. 2006. p. 1529-1532. 4152244 https://doi.org/10.1109/ULTSYM.2006.388
Kawamoto, Takayuki ; Matsukawa, Mami ; Watanabe, Yoshiaki ; Yanagitani, Takahiko. / Study on formation mechanism of (112̄0) textured Zno films. Proceedings - IEEE Ultrasonics Symposium. Vol. 1 2006. pp. 1529-1532
@inproceedings{13d9f766b6c94091b3610210a1e27865,
title = "Study on formation mechanism of (112̄0) textured Zno films",
abstract = "The ZnO films where crystallites c-axis are unidirectionally aligned in the substrate plane ((112̄0) textured ZnO films) realize shear mode devices. In this study, we have studied the formation mechanism of the (112̄0) textured ZnO film, focusing on the effect of total pressure and partial pressure of oxygen and argon during sputtering deposition. In addition to the X-ray diffraction (XRD) measurement of the films, optical emissions from the RF plasma were analyzed to investigate the effect of ionic species on the growth of the ZnO films. Highly crystallized (112̄0) textured ZnO films were obtained in conditions of low total gas pressure and high oxygen concentration. In these conditions, strong optical emission spectra from oxygen species were strongly observed. The best shear mode electromechanical coupling coefficient k 15 of the film was 0.16, which was 62 {\%} of the value of single crystal.",
keywords = "(112̄0) textured ZnO films; RF magnetron sputtering; optical emission spectroscopy",
author = "Takayuki Kawamoto and Mami Matsukawa and Yoshiaki Watanabe and Takahiko Yanagitani",
year = "2006",
doi = "10.1109/ULTSYM.2006.388",
language = "English",
isbn = "1424402018",
volume = "1",
pages = "1529--1532",
booktitle = "Proceedings - IEEE Ultrasonics Symposium",

}

TY - GEN

T1 - Study on formation mechanism of (112̄0) textured Zno films

AU - Kawamoto, Takayuki

AU - Matsukawa, Mami

AU - Watanabe, Yoshiaki

AU - Yanagitani, Takahiko

PY - 2006

Y1 - 2006

N2 - The ZnO films where crystallites c-axis are unidirectionally aligned in the substrate plane ((112̄0) textured ZnO films) realize shear mode devices. In this study, we have studied the formation mechanism of the (112̄0) textured ZnO film, focusing on the effect of total pressure and partial pressure of oxygen and argon during sputtering deposition. In addition to the X-ray diffraction (XRD) measurement of the films, optical emissions from the RF plasma were analyzed to investigate the effect of ionic species on the growth of the ZnO films. Highly crystallized (112̄0) textured ZnO films were obtained in conditions of low total gas pressure and high oxygen concentration. In these conditions, strong optical emission spectra from oxygen species were strongly observed. The best shear mode electromechanical coupling coefficient k 15 of the film was 0.16, which was 62 % of the value of single crystal.

AB - The ZnO films where crystallites c-axis are unidirectionally aligned in the substrate plane ((112̄0) textured ZnO films) realize shear mode devices. In this study, we have studied the formation mechanism of the (112̄0) textured ZnO film, focusing on the effect of total pressure and partial pressure of oxygen and argon during sputtering deposition. In addition to the X-ray diffraction (XRD) measurement of the films, optical emissions from the RF plasma were analyzed to investigate the effect of ionic species on the growth of the ZnO films. Highly crystallized (112̄0) textured ZnO films were obtained in conditions of low total gas pressure and high oxygen concentration. In these conditions, strong optical emission spectra from oxygen species were strongly observed. The best shear mode electromechanical coupling coefficient k 15 of the film was 0.16, which was 62 % of the value of single crystal.

KW - (112̄0) textured ZnO films; RF magnetron sputtering; optical emission spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=34548132574&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34548132574&partnerID=8YFLogxK

U2 - 10.1109/ULTSYM.2006.388

DO - 10.1109/ULTSYM.2006.388

M3 - Conference contribution

AN - SCOPUS:34548132574

SN - 1424402018

SN - 9781424402014

VL - 1

SP - 1529

EP - 1532

BT - Proceedings - IEEE Ultrasonics Symposium

ER -