Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama; Akihiro Oshima; Hiroki Yamamoto; Seiichi Tagawa; Masakazu Washio

doi:10.1143/APEX.4.076501

Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama^*, Akihiro Oshima, Hiroki Yamamoto, Seiichi Tagawa, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm^-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

Original language	English
Article number	076501
Journal	Applied Physics Express
Volume	4
Issue number	7
DOIs	https://doi.org/10.1143/APEX.4.076501
Publication status	Published - 2011 Jul

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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abstract = "The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.",

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AU - Oyama, Tomoko Gowa

AU - Oshima, Akihiro

AU - Yamamoto, Hiroki

AU - Tagawa, Seiichi

AU - Washio, Masakazu

PY - 2011/7

Y1 - 2011/7

N2 - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

AB - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

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Study on positive-negative inversion of chlorinated resist materials

Abstract

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