Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama, Akihiro Oshima, Hiroki Yamamoto, Seiichi Tagawa, Masakazu Washio

    Research output: Contribution to journalArticle

    15 Citations (Scopus)

    Abstract

    The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

    Original languageEnglish
    Article number076501
    JournalApplied Physics Express
    Volume4
    Issue number7
    DOIs
    Publication statusPublished - 2011 Jul

    Fingerprint

    Dosimetry
    Irradiation
    inversions
    dosage
    irradiation
    Electron beams
    electron beams
    electron attachment
    Ultraviolet visible spectroscopy
    crosslinking
    Crosslinking
    Chlorine
    Ion beams
    chlorine
    cleavage
    X ray photoelectron spectroscopy
    ion beams
    photoelectron spectroscopy
    Electrons
    spectroscopy

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Cite this

    Study on positive-negative inversion of chlorinated resist materials. / Oyama, Tomoko Gowa; Oshima, Akihiro; Yamamoto, Hiroki; Tagawa, Seiichi; Washio, Masakazu.

    In: Applied Physics Express, Vol. 4, No. 7, 076501, 07.2011.

    Research output: Contribution to journalArticle

    Oyama, Tomoko Gowa ; Oshima, Akihiro ; Yamamoto, Hiroki ; Tagawa, Seiichi ; Washio, Masakazu. / Study on positive-negative inversion of chlorinated resist materials. In: Applied Physics Express. 2011 ; Vol. 4, No. 7.
    @article{1fea5082e6c74011abb5307a89e014cd,
    title = "Study on positive-negative inversion of chlorinated resist materials",
    abstract = "The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.",
    author = "Oyama, {Tomoko Gowa} and Akihiro Oshima and Hiroki Yamamoto and Seiichi Tagawa and Masakazu Washio",
    year = "2011",
    month = "7",
    doi = "10.1143/APEX.4.076501",
    language = "English",
    volume = "4",
    journal = "Applied Physics Express",
    issn = "1882-0778",
    publisher = "Japan Society of Applied Physics",
    number = "7",

    }

    TY - JOUR

    T1 - Study on positive-negative inversion of chlorinated resist materials

    AU - Oyama, Tomoko Gowa

    AU - Oshima, Akihiro

    AU - Yamamoto, Hiroki

    AU - Tagawa, Seiichi

    AU - Washio, Masakazu

    PY - 2011/7

    Y1 - 2011/7

    N2 - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

    AB - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

    UR - http://www.scopus.com/inward/record.url?scp=79960230104&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=79960230104&partnerID=8YFLogxK

    U2 - 10.1143/APEX.4.076501

    DO - 10.1143/APEX.4.076501

    M3 - Article

    AN - SCOPUS:79960230104

    VL - 4

    JO - Applied Physics Express

    JF - Applied Physics Express

    SN - 1882-0778

    IS - 7

    M1 - 076501

    ER -