Abstract
Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.
| Original language | English |
|---|---|
| Pages (from-to) | 381-386 |
| Number of pages | 6 |
| Journal | Journal of Photopolymer Science and Technology |
| Volume | 23 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2010 |
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Keywords
- F solid-state NMR
- Direct photo etching
- K-edge absorption
- Perfluorinated polymers
- Synchrotron radiation
ASJC Scopus subject areas
- Materials Chemistry
- Polymers and Plastics
- Organic Chemistry
Cite this
Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom. / Oshima, Akihiro; Nagai, Hiroyuki; Hyuga, Toshiyuki; Miyoshi, Nozomi; Urakawa, Tatsuya; Murata, Katsuyoshi; Katoh, Takanori; Katoh, Etshuko; Washio, Masakazu.
In: Journal of Photopolymer Science and Technology, Vol. 23, No. 3, 2010, p. 381-386.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom
AU - Oshima, Akihiro
AU - Nagai, Hiroyuki
AU - Hyuga, Toshiyuki
AU - Miyoshi, Nozomi
AU - Urakawa, Tatsuya
AU - Murata, Katsuyoshi
AU - Katoh, Takanori
AU - Katoh, Etshuko
AU - Washio, Masakazu
PY - 2010
Y1 - 2010
N2 - Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.
AB - Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.
KW - F solid-state NMR
KW - Direct photo etching
KW - K-edge absorption
KW - Perfluorinated polymers
KW - Synchrotron radiation
UR - http://www.scopus.com/inward/record.url?scp=77957104831&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77957104831&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.23.381
DO - 10.2494/photopolymer.23.381
M3 - Article
AN - SCOPUS:77957104831
VL - 23
SP - 381
EP - 386
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 3
ER -