Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

Akihiro Oshima; Hiroyuki Nagai; Toshiyuki Hyuga; Nozomi Miyoshi; Tatsuya Urakawa; Katsuyoshi Murata; Takanori Katoh; Etshuko Katoh; Masakazu Washio

doi:10.2494/photopolymer.23.381

Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

Akihiro Oshima, Hiroyuki Nagai, Toshiyuki Hyuga, Nozomi Miyoshi, Tatsuya Urakawa, Katsuyoshi Murata, Takanori Katoh, Etshuko Katoh, Masakazu Washio

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and ¹⁹F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.

Original language	English
Pages (from-to)	381-386
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	23
Issue number	3
DOIs	https://doi.org/10.2494/photopolymer.23.381
Publication status	Published - 2010

Keywords

Direct photo etching
F solid-state NMR
K-edge absorption
Perfluorinated polymers
Synchrotron radiation

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.23.381

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Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom. / Oshima, Akihiro; Nagai, Hiroyuki; Hyuga, Toshiyuki; Miyoshi, Nozomi; Urakawa, Tatsuya; Murata, Katsuyoshi; Katoh, Takanori; Katoh, Etshuko; Washio, Masakazu.

In: Journal of Photopolymer Science and Technology, Vol. 23, No. 3, 2010, p. 381-386.

Research output: Contribution to journal › Article › peer-review

@article{c20e645aa1e644b28043a83cdb820396,

title = "Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom",

abstract = "Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.",

keywords = "Direct photo etching, F solid-state NMR, K-edge absorption, Perfluorinated polymers, Synchrotron radiation",

author = "Akihiro Oshima and Hiroyuki Nagai and Toshiyuki Hyuga and Nozomi Miyoshi and Tatsuya Urakawa and Katsuyoshi Murata and Takanori Katoh and Etshuko Katoh and Masakazu Washio",

year = "2010",

doi = "10.2494/photopolymer.23.381",

language = "English",

volume = "23",

pages = "381--386",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "3",

}

TY - JOUR

T1 - Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

AU - Oshima, Akihiro

AU - Nagai, Hiroyuki

AU - Hyuga, Toshiyuki

AU - Miyoshi, Nozomi

AU - Urakawa, Tatsuya

AU - Murata, Katsuyoshi

AU - Katoh, Takanori

AU - Katoh, Etshuko

AU - Washio, Masakazu

PY - 2010

Y1 - 2010

N2 - Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.

AB - Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.

KW - Direct photo etching

KW - F solid-state NMR

KW - K-edge absorption

KW - Perfluorinated polymers

KW - Synchrotron radiation

UR - http://www.scopus.com/inward/record.url?scp=77957104831&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77957104831&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.23.381

DO - 10.2494/photopolymer.23.381

M3 - Article

AN - SCOPUS:77957104831

VL - 23

SP - 381

EP - 386

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

SN - 0914-9244

IS - 3

ER -

Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

Abstract

Keywords

ASJC Scopus subject areas

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