Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

Akihiro Oshima, Hiroyuki Nagai, Toshiyuki Hyuga, Nozomi Miyoshi, Tatsuya Urakawa, Katsuyoshi Murata, Takanori Katoh, Etshuko Katoh, Masakazu Washio

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.

    Original languageEnglish
    Pages (from-to)381-386
    Number of pages6
    JournalJournal of Photopolymer Science and Technology
    Volume23
    Issue number3
    DOIs
    Publication statusPublished - 2010

    Fingerprint

    Synchrotron radiation
    Etching
    Polymers
    Polytetrafluoroethylene
    Atoms
    Microfabrication
    Polytetrafluoroethylenes
    Crosslinking
    Nuclear magnetic resonance spectroscopy
    Surface treatment
    Microscopes
    Irradiation
    Microstructure

    Keywords

    • F solid-state NMR
    • Direct photo etching
    • K-edge absorption
    • Perfluorinated polymers
    • Synchrotron radiation

    ASJC Scopus subject areas

    • Materials Chemistry
    • Polymers and Plastics
    • Organic Chemistry

    Cite this

    Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom. / Oshima, Akihiro; Nagai, Hiroyuki; Hyuga, Toshiyuki; Miyoshi, Nozomi; Urakawa, Tatsuya; Murata, Katsuyoshi; Katoh, Takanori; Katoh, Etshuko; Washio, Masakazu.

    In: Journal of Photopolymer Science and Technology, Vol. 23, No. 3, 2010, p. 381-386.

    Research output: Contribution to journalArticle

    Oshima, Akihiro ; Nagai, Hiroyuki ; Hyuga, Toshiyuki ; Miyoshi, Nozomi ; Urakawa, Tatsuya ; Murata, Katsuyoshi ; Katoh, Takanori ; Katoh, Etshuko ; Washio, Masakazu. / Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom. In: Journal of Photopolymer Science and Technology. 2010 ; Vol. 23, No. 3. pp. 381-386.
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    abstract = "Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.",
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    author = "Akihiro Oshima and Hiroyuki Nagai and Toshiyuki Hyuga and Nozomi Miyoshi and Tatsuya Urakawa and Katsuyoshi Murata and Takanori Katoh and Etshuko Katoh and Masakazu Washio",
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    AU - Oshima, Akihiro

    AU - Nagai, Hiroyuki

    AU - Hyuga, Toshiyuki

    AU - Miyoshi, Nozomi

    AU - Urakawa, Tatsuya

    AU - Murata, Katsuyoshi

    AU - Katoh, Takanori

    AU - Katoh, Etshuko

    AU - Washio, Masakazu

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    AB - Micro-fabrications of various perfluorinated polymers were carried out by the synchrotron radiation (SR) direct photo etching, and the SR-induced surface modifications were studied by DSC and 19F solid-state NMR spectroscopy. The etching depth measurements of perfluorinated polymers were carried out by optical microscope. Although ETFE could be hardly etched, it was confirmed that the microstructures of PFA and FEP could be fabricated by SR direct photo etching. It was found that the etching rate of FEP at 140 °C was highest and those of PTFE and PFA at 140 °C were lower. It was found that crosslinking reactions were induced by the SR-irradiation at the region within 50 μm from the irradiated surface.

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