Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

Akihiro Oshima*, Hiroyuki Nagai, Toshiyuki Hyuga, Nozomi Miyoshi, Tatsuya Urakawa, Katsuyoshi Murata, Takanori Katoh, Etshuko Katoh, Masakazu Washio

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds