Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold

Tomohiro Takahashi, Yuya Takasawa, Tomoko Gowa, Satoshi Okubo, Takashi Sasaki, Takaharu Miura, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

    Research output: Contribution to journalArticle

    6 Citations (Scopus)

    Abstract

    Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.

    Original languageEnglish
    Pages (from-to)69-74
    Number of pages6
    JournalJournal of Photopolymer Science and Technology
    Volume23
    Issue number1
    DOIs
    Publication statusPublished - 2010

    Fingerprint

    Nanoimprint lithography
    Polytetrafluoroethylene
    Polytetrafluoroethylenes
    Electron beams
    Molds
    Electron microscopes
    Scanning
    Focused ion beams
    Linewidth
    Field emission
    Aspect ratio
    Experiments

    Keywords

    • Crosslinked PTFE
    • EB
    • Nanoimprint lithography
    • TMPTA
    • UV

    ASJC Scopus subject areas

    • Materials Chemistry
    • Polymers and Plastics
    • Organic Chemistry

    Cite this

    Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold. / Takahashi, Tomohiro; Takasawa, Yuya; Gowa, Tomoko; Okubo, Satoshi; Sasaki, Takashi; Miura, Takaharu; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.

    In: Journal of Photopolymer Science and Technology, Vol. 23, No. 1, 2010, p. 69-74.

    Research output: Contribution to journalArticle

    Takahashi, T, Takasawa, Y, Gowa, T, Okubo, S, Sasaki, T, Miura, T, Oshima, A, Tagawa, S & Washio, M 2010, 'Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold', Journal of Photopolymer Science and Technology, vol. 23, no. 1, pp. 69-74. https://doi.org/10.2494/photopolymer.23.69
    Takahashi, Tomohiro ; Takasawa, Yuya ; Gowa, Tomoko ; Okubo, Satoshi ; Sasaki, Takashi ; Miura, Takaharu ; Oshima, Akihiro ; Tagawa, Seiichi ; Washio, Masakazu. / Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold. In: Journal of Photopolymer Science and Technology. 2010 ; Vol. 23, No. 1. pp. 69-74.
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