Abstract
Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.
Original language | English |
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Pages (from-to) | 69-74 |
Number of pages | 6 |
Journal | Journal of Photopolymer Science and Technology |
Volume | 23 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2010 |
Keywords
- Crosslinked PTFE
- EB
- Nanoimprint lithography
- TMPTA
- UV
ASJC Scopus subject areas
- Polymers and Plastics
- Organic Chemistry
- Materials Chemistry