Abstract
Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.
| Original language | English |
|---|---|
| Pages (from-to) | 69-74 |
| Number of pages | 6 |
| Journal | Journal of Photopolymer Science and Technology |
| Volume | 23 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2010 |
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Keywords
- Crosslinked PTFE
- EB
- Nanoimprint lithography
- TMPTA
- UV
ASJC Scopus subject areas
- Materials Chemistry
- Polymers and Plastics
- Organic Chemistry
Cite this
Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold. / Takahashi, Tomohiro; Takasawa, Yuya; Gowa, Tomoko; Okubo, Satoshi; Sasaki, Takashi; Miura, Takaharu; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.
In: Journal of Photopolymer Science and Technology, Vol. 23, No. 1, 2010, p. 69-74.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold
AU - Takahashi, Tomohiro
AU - Takasawa, Yuya
AU - Gowa, Tomoko
AU - Okubo, Satoshi
AU - Sasaki, Takashi
AU - Miura, Takaharu
AU - Oshima, Akihiro
AU - Tagawa, Seiichi
AU - Washio, Masakazu
PY - 2010
Y1 - 2010
N2 - Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.
AB - Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.
KW - Crosslinked PTFE
KW - EB
KW - Nanoimprint lithography
KW - TMPTA
KW - UV
UR - http://www.scopus.com/inward/record.url?scp=77957119715&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77957119715&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.23.69
DO - 10.2494/photopolymer.23.69
M3 - Article
AN - SCOPUS:77957119715
VL - 23
SP - 69
EP - 74
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 1
ER -