Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold

Tomohiro Takahashi; Yuya Takasawa; Tomoko Gowa; Satoshi Okubo; Takashi Sasaki; Takaharu Miura; Akihiro Oshima; Seiichi Tagawa; Masakazu Washio

doi:10.2494/photopolymer.23.69

Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold

Tomohiro Takahashi^*, Yuya Takasawa, Tomoko Gowa, Satoshi Okubo, Takashi Sasaki, Takaharu Miura, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.

Original language	English
Pages (from-to)	69-74
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	23
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.23.69
Publication status	Published - 2010

Keywords

Crosslinked PTFE
EB
Nanoimprint lithography
TMPTA
UV

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.23.69

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title = "Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold",

abstract = "Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.",

keywords = "Crosslinked PTFE, EB, Nanoimprint lithography, TMPTA, UV",

author = "Tomohiro Takahashi and Yuya Takasawa and Tomoko Gowa and Satoshi Okubo and Takashi Sasaki and Takaharu Miura and Akihiro Oshima and Seiichi Tagawa and Masakazu Washio",

year = "2010",

doi = "10.2494/photopolymer.23.69",

language = "English",

volume = "23",

pages = "69--74",

journal = "Journal of Photopolymer Science and Technology",

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publisher = "Tokai University",

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AU - Takahashi, Tomohiro

AU - Takasawa, Yuya

AU - Gowa, Tomoko

AU - Okubo, Satoshi

AU - Sasaki, Takashi

AU - Miura, Takaharu

AU - Oshima, Akihiro

AU - Tagawa, Seiichi

AU - Washio, Masakazu

PY - 2010

Y1 - 2010

N2 - Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.

AB - Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.

KW - Crosslinked PTFE

KW - EB

KW - Nanoimprint lithography

KW - TMPTA

KW - UV

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Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold

Abstract

Keywords

ASJC Scopus subject areas

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