Submicrometer-Gate MOSFET's by the Use of Focused-Ion-Beam Exposure and a Dry Development Technique

Hiroaki Morimoto, Katsuhiro Tsukamoto, Hirofumi Shinohara, Masahide Inuishi, Tadao Kato

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

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Engineering & Materials Science

Chemical Compounds