Surface morphology characterization of pentacene thin film and its substrate with under-layers by power spectral density using fast Fourier transform algorithms

Taketsugu Itoh, Noriyoshi Yamauchi

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43 Citations (Scopus)

Abstract

Surface morphology of pentacene thin films and their substrates with under-layers is characterized by using atomic force microscopy (AFM). The power values of power spectral density (PSD) for the AFM digital data were determined by the fast Fourier transform (FFT) algorithms instead of the root-mean-square (rms) and peak-to-valley value. The PSD plots of pentacene films on glass substrate are successfully approximated by the k-correlation model. The pentacene film growth is interpreted the intermediation of the bulk and surface diffusion by parameter C of k-correlation model. The PSD plots of pentacene film on Au under-layer is approximated by using the linear continuum model (LCM) instead of the combination model of the k-correlation model and Gaussian function. The PSD plots of SiO 2 layer on Au under-layer as a gate insulator on a gate electrode of organic thin film transistors (OTFTs) have three power values of PSD. It is interpreted that the specific three PSD power values are caused by the planarization of the smooth SiO 2 layer to rough Au under-layer.

Original languageEnglish
Pages (from-to)6196-6202
Number of pages7
JournalApplied Surface Science
Volume253
Issue number14
DOIs
Publication statusPublished - 2007 May 15

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Keywords

  • Atomic force microscopy
  • Fast Fourier transform
  • Pentacene
  • Power spectral density

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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