Synchrotron-radiation photochemical-vapor deposition of amorphous carbon

A. Endo, S. Takami, Toshio Ohsawa, I. Honma, H. Komiyama

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

High-energy synchrotron-radiation (SR) light was applied to the photochemical-vapor deposition of amorphous carbon films. The source gases of CH4 and H2 have been directly photodissociated by the ultraviolet SR light to deposit carbon films on the heated Si substrate. The film structure was characterized by field-emission scanning electron microscopy, Raman scattering, and infrared absorption, which indicate the film to be a rigid amorphous structure comprised of mostly sp3-bonded carbon. The advantage as well as the limitation of the synchrotron-radiation process to the synthesis of functional materials is discussed.

Original languageEnglish
Pages (from-to)3453-3457
Number of pages5
JournalJournal of Applied Physics
Volume77
Issue number7
DOIs
Publication statusPublished - 1995
Externally publishedYes

Fingerprint

synchrotron radiation
vapor deposition
carbon
infrared absorption
field emission
deposits
Raman spectra
scanning electron microscopy
synthesis
gases
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Synchrotron-radiation photochemical-vapor deposition of amorphous carbon. / Endo, A.; Takami, S.; Ohsawa, Toshio; Honma, I.; Komiyama, H.

In: Journal of Applied Physics, Vol. 77, No. 7, 1995, p. 3453-3457.

Research output: Contribution to journalArticle

Endo, A. ; Takami, S. ; Ohsawa, Toshio ; Honma, I. ; Komiyama, H. / Synchrotron-radiation photochemical-vapor deposition of amorphous carbon. In: Journal of Applied Physics. 1995 ; Vol. 77, No. 7. pp. 3453-3457.
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