Synergistic enhancement of direct synchrotron radiation etching of a resist by a low-energy oxygen beam

Hiroshi Murakami, Shingo Ichimura, Hazime Shimizu, Isao Kudo, Nobufumi Atoda

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The effect of the simultaneous irradiation of a low-energy oxygen ion beam with synchrotron radiation (SR) was investigated. The purpose was the enhancement of the direct resist etching by SR. Although the removal by sputtering of the resist was observed due to the wide energy width of the ion beam used, it was confirmed that the net SR etching, which was estimated after subtraction of the sputtering contribution, increased about two times. Possibilities for the enhancement of this “synergistic effect” induced by low-energy ion beam bombardment to improve the direct SR etching and make it more practical are also discussed.

Original languageEnglish
Pages (from-to)L1774-L1776
JournalJapanese journal of applied physics
Volume26
Issue number11 A
DOIs
Publication statusPublished - 1987 Nov
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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