TY - JOUR
T1 - Synergistic enhancement of direct synchrotron radiation etching of a resist by a low-energy oxygen beam
AU - Murakami, Hiroshi
AU - Ichimura, Shingo
AU - Shimizu, Hazime
AU - Kudo, Isao
AU - Atoda, Nobufumi
PY - 1987/11
Y1 - 1987/11
N2 - The effect of the simultaneous irradiation of a low-energy oxygen ion beam with synchrotron radiation (SR) was investigated. The purpose was the enhancement of the direct resist etching by SR. Although the removal by sputtering of the resist was observed due to the wide energy width of the ion beam used, it was confirmed that the net SR etching, which was estimated after subtraction of the sputtering contribution, increased about two times. Possibilities for the enhancement of this “synergistic effect” induced by low-energy ion beam bombardment to improve the direct SR etching and make it more practical are also discussed.
AB - The effect of the simultaneous irradiation of a low-energy oxygen ion beam with synchrotron radiation (SR) was investigated. The purpose was the enhancement of the direct resist etching by SR. Although the removal by sputtering of the resist was observed due to the wide energy width of the ion beam used, it was confirmed that the net SR etching, which was estimated after subtraction of the sputtering contribution, increased about two times. Possibilities for the enhancement of this “synergistic effect” induced by low-energy ion beam bombardment to improve the direct SR etching and make it more practical are also discussed.
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U2 - 10.1143/JJAP.26.L1774
DO - 10.1143/JJAP.26.L1774
M3 - Article
AN - SCOPUS:0023453198
SN - 0021-4922
VL - 26
SP - L1774-L1776
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 11 A
ER -