Synthesis of diamond films at lower pressure and lower temperature using magneto-microwave plasma CVD

Jun ichi Suzuki, Hiroshi Kawarada, King Sheng Mar, Jin Wei, Yoshihiro Yokota, Akio Hiraki

Research output: Contribution to journalArticle

53 Citations (Scopus)

Abstract

Diamond films have been obtained using magneto-microwave plasma assisted CVD at 0.1 Torr. The reaction gas is a CO/H2 mixture. By setting the ECR condition at the deposition area, a high density plasma (1×1011cm-3) is obtained around the substrate. The discharge area is quite uniform in the pressure. Diamond films are obtained on positively biased substrates. As the reaction pressure becomes lower, the substrate temperature for the diamond formation tends to decrease. The films were evaluated by SEM imaging, electron diffraction and Raman spectroscopy.

Original languageEnglish
Pages (from-to)281-283
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume28
Issue number2
Publication statusPublished - 1989 Feb
Externally publishedYes

Fingerprint

Plasma CVD
Diamond films
diamond films
low pressure
Microwaves
vapor deposition
microwaves
Substrates
synthesis
Plasma density
Electron diffraction
Temperature
plasma density
temperature
Raman spectroscopy
Chemical vapor deposition
Diamonds
electron diffraction
diamonds
Plasmas

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Synthesis of diamond films at lower pressure and lower temperature using magneto-microwave plasma CVD. / Suzuki, Jun ichi; Kawarada, Hiroshi; Mar, King Sheng; Wei, Jin; Yokota, Yoshihiro; Hiraki, Akio.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 28, No. 2, 02.1989, p. 281-283.

Research output: Contribution to journalArticle

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AU - Hiraki, Akio

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