Synthesis of multilayered silica-based hybrid films from difunctional organosilanes by co-hydrolysis and polycondensation with tetraalkoxysilane

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    8 Citations (Scopus)

    Abstract

    Decylethyldimethoxysilane (C10EtDMS) and didecyldimethoxysilane (2C10DMS) were used to prepare thin films of silica-based hybrids by co-hydrolysis and polycondensation with tetramethoxysilane (TMOS) followed by spin-coating. The length of the second alkyl chains (Et or n -decyl) had large effects on the formation of ordered hybrid films. In the case of C10EtDMS, transparent films of well-ordered lamellar hybrids were formed with various TMOS/C10EtDMS ratios by controlling the degree of polycondensation in the precursor solutions. In contrast, no ordered hybrids were obtained in the case of 2C10DMS under the same conditions, due to the larger steric hindrance of the longer second alkyl chain in the co-condensation. Increases of both TMOS/2C10DMS and HCl/Si ratios in the starting solutions promoted polycondensation and lead to the formation of ordered hybrid films.

    Original languageEnglish
    Pages (from-to)223-227
    Number of pages5
    JournalJournal of Organometallic Chemistry
    Volume686
    Issue number1-2
    DOIs
    Publication statusPublished - 2003 Dec 1

    Fingerprint

    Polycondensation
    Silicon Dioxide
    hydrolysis
    Hydrolysis
    Silica
    silicon dioxide
    synthesis
    Spin coating
    coating
    Condensation
    condensation
    Thin films
    thin films
    tetramethoxysilane

    Keywords

    • Co-hydrolysis and polycondensation
    • Hybrid material
    • Organoalkoxysilane
    • Self-assembly
    • Sol-gel process

    ASJC Scopus subject areas

    • Biochemistry
    • Inorganic Chemistry
    • Organic Chemistry
    • Physical and Theoretical Chemistry
    • Materials Chemistry

    Cite this

    @article{c204c9e2ed5c4e4d87b5fe36c2becdb8,
    title = "Synthesis of multilayered silica-based hybrid films from difunctional organosilanes by co-hydrolysis and polycondensation with tetraalkoxysilane",
    abstract = "Decylethyldimethoxysilane (C10EtDMS) and didecyldimethoxysilane (2C10DMS) were used to prepare thin films of silica-based hybrids by co-hydrolysis and polycondensation with tetramethoxysilane (TMOS) followed by spin-coating. The length of the second alkyl chains (Et or n -decyl) had large effects on the formation of ordered hybrid films. In the case of C10EtDMS, transparent films of well-ordered lamellar hybrids were formed with various TMOS/C10EtDMS ratios by controlling the degree of polycondensation in the precursor solutions. In contrast, no ordered hybrids were obtained in the case of 2C10DMS under the same conditions, due to the larger steric hindrance of the longer second alkyl chain in the co-condensation. Increases of both TMOS/2C10DMS and HCl/Si ratios in the starting solutions promoted polycondensation and lead to the formation of ordered hybrid films.",
    keywords = "Co-hydrolysis and polycondensation, Hybrid material, Organoalkoxysilane, Self-assembly, Sol-gel process",
    author = "Noritaka Umeda and Atsushi Shimojima and Kazuyuki Kuroda",
    year = "2003",
    month = "12",
    day = "1",
    doi = "10.1016/S0022-328X(03)00619-3",
    language = "English",
    volume = "686",
    pages = "223--227",
    journal = "Journal of Organometallic Chemistry",
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    publisher = "Elsevier",
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    TY - JOUR

    T1 - Synthesis of multilayered silica-based hybrid films from difunctional organosilanes by co-hydrolysis and polycondensation with tetraalkoxysilane

    AU - Umeda, Noritaka

    AU - Shimojima, Atsushi

    AU - Kuroda, Kazuyuki

    PY - 2003/12/1

    Y1 - 2003/12/1

    N2 - Decylethyldimethoxysilane (C10EtDMS) and didecyldimethoxysilane (2C10DMS) were used to prepare thin films of silica-based hybrids by co-hydrolysis and polycondensation with tetramethoxysilane (TMOS) followed by spin-coating. The length of the second alkyl chains (Et or n -decyl) had large effects on the formation of ordered hybrid films. In the case of C10EtDMS, transparent films of well-ordered lamellar hybrids were formed with various TMOS/C10EtDMS ratios by controlling the degree of polycondensation in the precursor solutions. In contrast, no ordered hybrids were obtained in the case of 2C10DMS under the same conditions, due to the larger steric hindrance of the longer second alkyl chain in the co-condensation. Increases of both TMOS/2C10DMS and HCl/Si ratios in the starting solutions promoted polycondensation and lead to the formation of ordered hybrid films.

    AB - Decylethyldimethoxysilane (C10EtDMS) and didecyldimethoxysilane (2C10DMS) were used to prepare thin films of silica-based hybrids by co-hydrolysis and polycondensation with tetramethoxysilane (TMOS) followed by spin-coating. The length of the second alkyl chains (Et or n -decyl) had large effects on the formation of ordered hybrid films. In the case of C10EtDMS, transparent films of well-ordered lamellar hybrids were formed with various TMOS/C10EtDMS ratios by controlling the degree of polycondensation in the precursor solutions. In contrast, no ordered hybrids were obtained in the case of 2C10DMS under the same conditions, due to the larger steric hindrance of the longer second alkyl chain in the co-condensation. Increases of both TMOS/2C10DMS and HCl/Si ratios in the starting solutions promoted polycondensation and lead to the formation of ordered hybrid films.

    KW - Co-hydrolysis and polycondensation

    KW - Hybrid material

    KW - Organoalkoxysilane

    KW - Self-assembly

    KW - Sol-gel process

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