Temperature dependence of mobility and Hall coefficient factor for holes of highly pure silicon

K. Takeda*, K. Sakui, M. Sakata

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

Considering the warping, the non-parabolicity of equienergy surfaces and the existence of three sub-band holes, the authors calculated the mobility and Hall coefficient factor of holes in highly pure silicon. The interaction between sub-bands in the valence band of silicon gives the complicated temperature dependence for the hole mobility. The simple band as the DKK model was seen to be applicable only below 10K. Over 10K one should consider the effect of the interaction of sub-bands. Over 100K the contribution of the optical phonon scattering becomes considerable, which lowers the value of the mobility.

Original languageEnglish
Article number022
Pages (from-to)767-776
Number of pages10
JournalJournal of Physics C: Solid State Physics
Volume15
Issue number4
DOIs
Publication statusPublished - 1982 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint

Dive into the research topics of 'Temperature dependence of mobility and Hall coefficient factor for holes of highly pure silicon'. Together they form a unique fingerprint.

Cite this